JPS5489196A - Ion source device - Google Patents

Ion source device

Info

Publication number
JPS5489196A
JPS5489196A JP15680677A JP15680677A JPS5489196A JP S5489196 A JPS5489196 A JP S5489196A JP 15680677 A JP15680677 A JP 15680677A JP 15680677 A JP15680677 A JP 15680677A JP S5489196 A JPS5489196 A JP S5489196A
Authority
JP
Japan
Prior art keywords
filament
location
high frequency
generation
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15680677A
Other languages
Japanese (ja)
Inventor
Kiyoshi Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15680677A priority Critical patent/JPS5489196A/en
Publication of JPS5489196A publication Critical patent/JPS5489196A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To lengthen the life of a filament, by generating eddy loss to the inside of the cylindrical filament, which location can be adjsuted, by outside high frequency coil action, and by ionizing gas by the generation of heat.
CONSTITUTION: A high frequency coil 34 is mounted around a cylindrical filament 30, and covered with a shield cylinder 36. A location adjusting mechanism 38 is installed to an upper portion of the shield cylinder 36 to adjust the upper and lower locations of the filament 30. When conducting the coil 34, eddy loss is formed at the inside of the filament 30, thermion is radiated by the generation of heat and inflow gas in an ionization chamber 14 is ionized. The filament 30 can be used for a long term because it is moved to the optimum location all the time even if it is wasted by ion bombardment at that time.
COPYRIGHT: (C)1979,JPO&Japio
JP15680677A 1977-12-26 1977-12-26 Ion source device Pending JPS5489196A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15680677A JPS5489196A (en) 1977-12-26 1977-12-26 Ion source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15680677A JPS5489196A (en) 1977-12-26 1977-12-26 Ion source device

Publications (1)

Publication Number Publication Date
JPS5489196A true JPS5489196A (en) 1979-07-14

Family

ID=15635722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15680677A Pending JPS5489196A (en) 1977-12-26 1977-12-26 Ion source device

Country Status (1)

Country Link
JP (1) JPS5489196A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08111198A (en) * 1994-10-11 1996-04-30 Ulvac Japan Ltd Ion source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08111198A (en) * 1994-10-11 1996-04-30 Ulvac Japan Ltd Ion source

Similar Documents

Publication Publication Date Title
ATE158384T1 (en) ELECTRONIC CYCLOTRON RESONANCE ION ENGINE
JPS6486435A (en) Flood-gun device and method of neutralize charge on wafer
ATE102395T1 (en) DEVICE FOR SURFACE TREATMENT OF WORKPIECES.
JPS55116249A (en) Electron arresting type detector
GB982669A (en) Improvements in or relating to electron beam generators
GB1101293A (en) High output duoplasmatron-type ion source
JPS5343594A (en) Ion source for chemical ionization
JPS5489196A (en) Ion source device
GB1102462A (en) Improvements relating to mass spectrometer ion sources
ATE133315T1 (en) FAST ATOMIC BEAM SOURCE
JPS6448338A (en) Multiphase gas expansion breaker
GB1057425A (en) Improvements in and relating to radiation detectors
FR2287792A1 (en) Ionization head for negative ions - has cathode through opening in anode plate which has electric coil expelling ionised air
KR970063436A (en) Inductively coupled plasma generator using grid-type gas injection
GB821744A (en) Plasma generator
JPS5279758A (en) Electronic gun
JPS5469275A (en) Fluorescent lamp
JPS53105699A (en) Cold cathod discharging type ion source device
JPS5472534A (en) High frequency heating device
JPS5271185A (en) Rotating anode x-ray tube
SU1665717A1 (en) Magnetron sprayer with thermoelectronic ionizer
JPS62165839A (en) Arc chamber device for ion source
JPS5696839A (en) Microwave plasma treating device
JPS52122725A (en) Circulating exhaust gas valve
LIBBY et al. Continuous plasma light source(Apparatus for producing monochromatic light from continuous plasma source)[Patent]