JPS548537B2 - - Google Patents
Info
- Publication number
- JPS548537B2 JPS548537B2 JP966175A JP966175A JPS548537B2 JP S548537 B2 JPS548537 B2 JP S548537B2 JP 966175 A JP966175 A JP 966175A JP 966175 A JP966175 A JP 966175A JP S548537 B2 JPS548537 B2 JP S548537B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US435844A US3925170A (en) | 1974-01-23 | 1974-01-23 | Method and composition for producing bright palladium electrodepositions |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS50123532A JPS50123532A (enrdf_load_stackoverflow) | 1975-09-29 |
JPS548537B2 true JPS548537B2 (enrdf_load_stackoverflow) | 1979-04-17 |
Family
ID=23730043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP966175A Expired JPS548537B2 (enrdf_load_stackoverflow) | 1974-01-23 | 1975-01-22 |
Country Status (3)
Country | Link |
---|---|
US (1) | US3925170A (enrdf_load_stackoverflow) |
JP (1) | JPS548537B2 (enrdf_load_stackoverflow) |
CA (1) | CA1036534A (enrdf_load_stackoverflow) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1495910A (en) * | 1975-10-30 | 1977-12-21 | Ibm | Method and bath for electroplating palladium on an articl |
US4028064A (en) * | 1976-02-17 | 1977-06-07 | Texas Instruments Incorporated | Beryllium copper plating process |
US4066517A (en) * | 1976-03-11 | 1978-01-03 | Oxy Metal Industries Corporation | Electrodeposition of palladium |
US4100039A (en) * | 1976-11-11 | 1978-07-11 | International Business Machines Corporation | Method for plating palladium-nickel alloy |
US4401527A (en) * | 1979-08-20 | 1983-08-30 | Occidental Chemical Corporation | Process for the electrodeposition of palladium |
CH649581A5 (de) * | 1979-08-20 | 1985-05-31 | Oxy Metal Industries Corp | Mittel zur elektrolytischen ablagerung von metallischem palladium auf einem substrat. |
US4297179A (en) * | 1980-09-02 | 1981-10-27 | American Chemical & Refining Company Incorporated | Palladium electroplating bath and process |
US4297177A (en) * | 1980-09-19 | 1981-10-27 | American Chemical & Refining Company Incorporated | Method and composition for electrodepositing palladium/nickel alloys |
US4392921A (en) * | 1980-12-17 | 1983-07-12 | Occidental Chemical Corporation | Composition and process for electroplating white palladium |
US4487665A (en) * | 1980-12-17 | 1984-12-11 | Omi International Corporation | Electroplating bath and process for white palladium |
US4545868A (en) * | 1981-10-06 | 1985-10-08 | Learonal, Inc. | Palladium plating |
US4622110A (en) * | 1981-10-06 | 1986-11-11 | Learonal, Inc. | Palladium plating |
DE3148788C2 (de) * | 1981-12-09 | 1986-08-21 | Siemens AG, 1000 Berlin und 8000 München | Wäßriges Bad und Verfahren zum galvanischen Abscheiden von glänzenden und rißfreien Palladiumschichten sowie Verfahren zur Herstellung des Bades |
JPS5967388A (ja) * | 1982-09-09 | 1984-04-17 | エンゲルハ−ド・コ−ポレ−シヨン | パラジウムメツキ浴 |
US4468296A (en) * | 1982-12-10 | 1984-08-28 | At&T Bell Laboratories | Process for electroplating palladium |
US4478692A (en) * | 1982-12-22 | 1984-10-23 | Learonal, Inc. | Electrodeposition of palladium-silver alloys |
US4778574A (en) * | 1987-09-14 | 1988-10-18 | American Chemical & Refining Company, Inc. | Amine-containing bath for electroplating palladium |
US5180482A (en) * | 1991-07-22 | 1993-01-19 | At&T Bell Laboratories | Thermal annealing of palladium alloys |
US5415685A (en) * | 1993-08-16 | 1995-05-16 | Enthone-Omi Inc. | Electroplating bath and process for white palladium |
FR2807450B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages |
TWI354716B (en) * | 2007-04-13 | 2011-12-21 | Green Hydrotec Inc | Palladium-containing plating solution and its uses |
CN101348928B (zh) * | 2007-07-20 | 2012-07-04 | 罗门哈斯电子材料有限公司 | 镀钯及镀钯合金之高速方法 |
US20110147225A1 (en) * | 2007-07-20 | 2011-06-23 | Rohm And Haas Electronic Materials Llc | High speed method for plating palladium and palladium alloys |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4733176B1 (enrdf_load_stackoverflow) * | 1967-01-11 | 1972-08-23 |
-
1974
- 1974-01-23 US US435844A patent/US3925170A/en not_active Expired - Lifetime
-
1975
- 1975-01-07 CA CA217,526A patent/CA1036534A/en not_active Expired
- 1975-01-22 JP JP966175A patent/JPS548537B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
USB435844I5 (enrdf_load_stackoverflow) | 1975-01-28 |
JPS50123532A (enrdf_load_stackoverflow) | 1975-09-29 |
CA1036534A (en) | 1978-08-15 |
US3925170A (en) | 1975-12-09 |