JPS5447582A - Mask aligner - Google Patents
Mask alignerInfo
- Publication number
- JPS5447582A JPS5447582A JP11336377A JP11336377A JPS5447582A JP S5447582 A JPS5447582 A JP S5447582A JP 11336377 A JP11336377 A JP 11336377A JP 11336377 A JP11336377 A JP 11336377A JP S5447582 A JPS5447582 A JP S5447582A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- chuck
- blow
- suction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To make dislodging of mask and wafer after exposure instantaneously by providing a backup plate for sucking and holding a mask in the central part of a mask holder and disposing a semiconductor wafer chuck of spherical form having suctio and blow-up functions in opposition thereto.
CONSTITUTION: A flat and thick plate form backup plate 12 made of quartz transmitting ultraviolet rays is beforehand fitted in the central part of a mask holder 13 which sucks and holds a mask 11. The bottom surface of this plate 12 is used as a mask suctin surface 14, and lead holes 16 for vacuuming are looked out upon both end edges thereof. On the other hand, the suction surface 18 of a wafer chuck 19 for sucking and holding a semiconductor wafer is made spherical and is provided with lead holes 20 which provides both suction and blow-up over th entire surface of the suction surface 18. With such constitution, the wafer 17 is sucked by the suction surface 18 of the chuck 19 and is thereby forced down, and air is blow up through the lead hoels 20 to contact the wafer 17 and mask 11. When exposure is complated after this, the lead holes 20 are chaned over to vacuuming to lower the chuck 19, whereby these are separated
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11336377A JPS5447582A (en) | 1977-09-22 | 1977-09-22 | Mask aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11336377A JPS5447582A (en) | 1977-09-22 | 1977-09-22 | Mask aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5447582A true JPS5447582A (en) | 1979-04-14 |
Family
ID=14610374
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11336377A Pending JPS5447582A (en) | 1977-09-22 | 1977-09-22 | Mask aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5447582A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990083568A (en) * | 1998-04-28 | 1999-11-25 | 다나카 아키히로 | Contact exposure method |
JP2002367895A (en) * | 2001-06-11 | 2002-12-20 | Fuji Photo Film Co Ltd | Method and apparatus for exposing photoresist as well as substrate |
-
1977
- 1977-09-22 JP JP11336377A patent/JPS5447582A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990083568A (en) * | 1998-04-28 | 1999-11-25 | 다나카 아키히로 | Contact exposure method |
JP2002367895A (en) * | 2001-06-11 | 2002-12-20 | Fuji Photo Film Co Ltd | Method and apparatus for exposing photoresist as well as substrate |
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