JPS5433669A - Surface stabilizing process for semiconductor device - Google Patents
Surface stabilizing process for semiconductor deviceInfo
- Publication number
- JPS5433669A JPS5433669A JP9992977A JP9992977A JPS5433669A JP S5433669 A JPS5433669 A JP S5433669A JP 9992977 A JP9992977 A JP 9992977A JP 9992977 A JP9992977 A JP 9992977A JP S5433669 A JPS5433669 A JP S5433669A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- stabilizing process
- surface stabilizing
- insulation layer
- alkyldisilazane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9992977A JPS5433669A (en) | 1977-08-20 | 1977-08-20 | Surface stabilizing process for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9992977A JPS5433669A (en) | 1977-08-20 | 1977-08-20 | Surface stabilizing process for semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5433669A true JPS5433669A (en) | 1979-03-12 |
JPS5649453B2 JPS5649453B2 (ja) | 1981-11-21 |
Family
ID=14260430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9992977A Granted JPS5433669A (en) | 1977-08-20 | 1977-08-20 | Surface stabilizing process for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5433669A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6451625A (en) * | 1987-08-24 | 1989-02-27 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1977
- 1977-08-20 JP JP9992977A patent/JPS5433669A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6451625A (en) * | 1987-08-24 | 1989-02-27 | Fujitsu Ltd | Manufacture of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS5649453B2 (ja) | 1981-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51144183A (en) | Semiconductor element containing surface protection film | |
JPS5351970A (en) | Manufacture for semiconductor substrate | |
JPS5293285A (en) | Structure for semiconductor device | |
JPS5224478A (en) | Semiconductor device manufacturing process | |
JPS5395571A (en) | Semiconductor device | |
JPS5433669A (en) | Surface stabilizing process for semiconductor device | |
JPS52131471A (en) | Surface treatment of substrate | |
JPS5242384A (en) | Semiconductor device | |
JPS5230188A (en) | Process for producing smiconductor device | |
JPS53109487A (en) | Manufacture for semiconductor device | |
JPS5420670A (en) | Surface stabilizing method of semiconductor elements | |
JPS5436182A (en) | Manufacture for semiconductor device | |
JPS51145267A (en) | Manufacture of semiconductor device | |
JPS5382174A (en) | Surface processing method for semiconductor device | |
JPS5227390A (en) | Electrode wiring formation system of semiconductor device | |
JPS5268371A (en) | Semiconductor device | |
JPS5220773A (en) | Semi-conductor element | |
JPS51138166A (en) | Production method of semiconductor device | |
JPS5252370A (en) | Fabrication of glass-sealed semiconductor device | |
JPS51138167A (en) | Production method of semiconductor device | |
JPS5284976A (en) | Contamination preventing method for sensitive corrosion-resistant resi ns | |
JPS53147479A (en) | Production of semiconductor device | |
JPS53102668A (en) | Manufacture for semiconductor device | |
JPS5334478A (en) | Semiconductor device | |
JPS547874A (en) | One side etching unit for semiconductor substrate |