JPS54155838A - Method of and device for developing positive picture - Google Patents

Method of and device for developing positive picture

Info

Publication number
JPS54155838A
JPS54155838A JP728479A JP728479A JPS54155838A JP S54155838 A JPS54155838 A JP S54155838A JP 728479 A JP728479 A JP 728479A JP 728479 A JP728479 A JP 728479A JP S54155838 A JPS54155838 A JP S54155838A
Authority
JP
Japan
Prior art keywords
positive picture
developing positive
developing
picture
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP728479A
Other languages
English (en)
Inventor
Esu Buratsukuutsudo Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fsi Corp
Original Assignee
Fsi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fsi Corp filed Critical Fsi Corp
Publication of JPS54155838A publication Critical patent/JPS54155838A/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B05B13/0421—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with rotating spray heads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/0221—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts
    • B05B13/0228—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts the movement of the objects being rotative
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
JP728479A 1978-05-23 1979-01-26 Method of and device for developing positive picture Pending JPS54155838A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/908,701 US4197000A (en) 1978-05-23 1978-05-23 Positive developing method and apparatus

Publications (1)

Publication Number Publication Date
JPS54155838A true JPS54155838A (en) 1979-12-08

Family

ID=25426133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP728479A Pending JPS54155838A (en) 1978-05-23 1979-01-26 Method of and device for developing positive picture

Country Status (4)

Country Link
US (1) US4197000A (ja)
JP (1) JPS54155838A (ja)
DE (1) DE2908112A1 (ja)
GB (1) GB2021979B (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5888240U (ja) * 1981-12-04 1983-06-15 富士写真光機株式会社 スピンケ−ジ装置
CN104465332A (zh) * 2014-12-31 2015-03-25 深圳市华星光电技术有限公司 一种基板清洗装置
CN109909105A (zh) * 2019-03-07 2019-06-21 重庆市佳禾家具制造有限公司 一种环保木门生产用环保植物漆上漆装置

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US4286541A (en) * 1979-07-26 1981-09-01 Fsi Corporation Applying photoresist onto silicon wafers
US4429983A (en) 1982-03-22 1984-02-07 International Business Machines Corporation Developing apparatus for exposed photoresist coated wafers
US4646784A (en) * 1983-05-23 1987-03-03 Union Carbide Corporation Liquid chemical dispensing apparatus
US4856544A (en) * 1984-05-21 1989-08-15 Cfm Technologies, Inc. Vessel and system for treating wafers with fluids
US4740249A (en) * 1984-05-21 1988-04-26 Christopher F. McConnell Method of treating wafers with fluid
US4911761A (en) * 1984-05-21 1990-03-27 Cfm Technologies Research Associates Process and apparatus for drying surfaces
US4633893A (en) * 1984-05-21 1987-01-06 Cfm Technologies Limited Partnership Apparatus for treating semiconductor wafers
US4577650A (en) * 1984-05-21 1986-03-25 Mcconnell Christopher F Vessel and system for treating wafers with fluids
US4738272A (en) * 1984-05-21 1988-04-19 Mcconnell Christopher F Vessel and system for treating wafers with fluids
US4691722A (en) * 1984-08-01 1987-09-08 Fsi Corporation Bowl for liquid spray processing machine
DE3566507D1 (en) * 1984-09-20 1989-01-05 Siemens Ag Electrostatic spray apparatus
US4646769A (en) * 1985-05-10 1987-03-03 J-B Industrial Corporation Precipitator cleaning tool for fossil burning installation
US4674521A (en) * 1985-05-20 1987-06-23 Machine Technology, Inc. Rinsing apparatus and method
JPS61279858A (ja) * 1985-06-05 1986-12-10 Mitsubishi Electric Corp ネガレジスト現像装置
US4795497A (en) * 1985-08-13 1989-01-03 Mcconnell Christopher F Method and system for fluid treatment of semiconductor wafers
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DE9013668U1 (ja) * 1990-09-29 1992-01-30 Hamatech Halbleiter-Maschinenbau Und Technologie Gmbh, 7137 Sternenfels, De
DE9103494U1 (ja) * 1991-03-21 1992-07-16 Hamatech Halbleiter-Maschinenbau Und Technologie Gmbh, 7137 Sternenfels, De
ATE258084T1 (de) * 1991-10-04 2004-02-15 Cfmt Inc Superreinigung von komplizierten mikroteilchen
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5301701A (en) * 1992-07-30 1994-04-12 Nafziger Charles P Single-chamber cleaning, rinsing and drying apparatus and method therefor
US5316035A (en) * 1993-02-19 1994-05-31 Fluoroware, Inc. Capacitive proximity monitoring device for corrosive atmosphere environment
DE9306138U1 (de) * 1993-04-23 1994-05-26 Kronseder Hermann Gefäßbehandlungsmaschine
US5863348A (en) * 1993-12-22 1999-01-26 International Business Machines Corporation Programmable method for cleaning semiconductor elements
US5431178A (en) * 1994-03-30 1995-07-11 Chiu; Hsien Hsin Centrifugal type, enclosed cleaning apparatus
US6532976B1 (en) * 1995-07-10 2003-03-18 Lg Semicon Co., Ltd. Semiconductor wafer cleaning apparatus
US5821035A (en) * 1996-03-06 1998-10-13 Sony Corporation Resist developing apparatus and resist developing method
US8028978B2 (en) * 1996-07-15 2011-10-04 Semitool, Inc. Wafer handling system
US5922138A (en) * 1996-08-12 1999-07-13 Tokyo Electron Limited Liquid treatment method and apparatus
US6109277A (en) * 1996-09-10 2000-08-29 Landa, Inc. Parts washer
WO1998035765A1 (en) * 1997-02-18 1998-08-20 Scp Global Technologies Multiple stage wet processing chamber
US6350322B1 (en) * 1997-03-21 2002-02-26 Micron Technology, Inc. Method of reducing water spotting and oxide growth on a semiconductor structure
JP3788845B2 (ja) * 1997-06-19 2006-06-21 富士写真フイルム株式会社 液体噴射装置及び液体噴射装置の作動方法
US6125551A (en) * 1998-03-17 2000-10-03 Verteq, Inc. Gas seal and support for rotating semiconductor processor
TW499504B (en) * 1999-09-09 2002-08-21 Yu-Tsai Liu Single chamber processing apparatus having multi-chamber functions
KR100360402B1 (ko) * 2000-03-22 2002-11-13 삼성전자 주식회사 회전성 분사노즐을 구비하는 웨이퍼 건조 장치 및 이를이용한 웨이퍼 건조 방법
US6418945B1 (en) * 2000-07-07 2002-07-16 Semitool, Inc. Dual cassette centrifugal processor
JP3662484B2 (ja) * 2000-08-09 2005-06-22 エム・エフエスアイ株式会社 ウェット処理方法及びウェット処理装置
US20020139400A1 (en) * 2001-03-27 2002-10-03 Semitool, Inc. Vertical process reactor
US6823880B2 (en) * 2001-04-25 2004-11-30 Kabushiki Kaisha Kobe Seiko Sho High pressure processing apparatus and high pressure processing method
KR20030046129A (ko) * 2001-12-05 2003-06-12 삼성전자주식회사 스피너장비 및 이를 이용한 레지스트층 현상방법
US6692094B1 (en) * 2002-07-23 2004-02-17 Eastman Kodak Company Apparatus and method of material deposition using compressed fluids
JP2006019575A (ja) * 2004-07-02 2006-01-19 Sharp Corp フォトレジストの現像方法及び現像装置
DE102004037848B4 (de) * 2004-08-04 2007-03-29 Advalytix Ag Probenträgerwaschbehälter, Probenträgerwaschstation, System zum Waschen von Probenträgern und Verfahren zum Waschen von Probenträgern
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US7255747B2 (en) 2004-12-22 2007-08-14 Sokudo Co., Ltd. Coat/develop module with independent stations
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
KR101431197B1 (ko) * 2008-01-24 2014-09-17 삼성전자주식회사 원자층 증착설비 및 그의 원자층 증착방법
JP5358630B2 (ja) * 2011-08-17 2013-12-04 富士フイルム株式会社 レジストパターン形成方法、ナノインプリント用モールドの製造方法、及びフォトマスクの製造方法
JP5377596B2 (ja) * 2011-08-22 2013-12-25 富士フイルム株式会社 レジストパターン形成方法、レジストパターン、ナノインプリント用モールドの製造方法、及びフォトマスクの製造方法
JP5377597B2 (ja) * 2011-08-22 2013-12-25 富士フイルム株式会社 レジストパターン形成方法、ナノインプリント用モールドの製造方法、及びフォトマスクの製造方法
FR3019886B1 (fr) * 2014-04-14 2019-04-05 Claire MAUREL Dispositif de sechage de piece et dispositif de lavage de piece utilisant un tel dispositif de sechage
CN105093594B (zh) * 2015-09-18 2018-09-18 京东方科技集团股份有限公司 一种剥离装置和显示基板生产线
KR101812101B1 (ko) * 2016-10-10 2017-12-26 (주)메디파마플랜 인공혈관 내부 코팅장치
US10239088B2 (en) 2017-03-22 2019-03-26 Ford Motor Company Fluid application system adapted to collect and reuse reclaimed fluid
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5888240U (ja) * 1981-12-04 1983-06-15 富士写真光機株式会社 スピンケ−ジ装置
CN104465332A (zh) * 2014-12-31 2015-03-25 深圳市华星光电技术有限公司 一种基板清洗装置
CN109909105A (zh) * 2019-03-07 2019-06-21 重庆市佳禾家具制造有限公司 一种环保木门生产用环保植物漆上漆装置

Also Published As

Publication number Publication date
DE2908112A1 (de) 1979-11-29
DE2908112C2 (ja) 1987-07-16
GB2021979A (en) 1979-12-12
GB2021979B (en) 1982-07-07
US4197000A (en) 1980-04-08

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