JPS54139483A - Photo resist coating device - Google Patents

Photo resist coating device

Info

Publication number
JPS54139483A
JPS54139483A JP4653578A JP4653578A JPS54139483A JP S54139483 A JPS54139483 A JP S54139483A JP 4653578 A JP4653578 A JP 4653578A JP 4653578 A JP4653578 A JP 4653578A JP S54139483 A JPS54139483 A JP S54139483A
Authority
JP
Japan
Prior art keywords
cover
pan
coating
wafer
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4653578A
Other languages
Japanese (ja)
Inventor
Takehisa Nishizawa
Masaki Tsukagoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4653578A priority Critical patent/JPS54139483A/en
Publication of JPS54139483A publication Critical patent/JPS54139483A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To avoid sticking of the linear resist caused at the coating time to the semiconductor wafer for the rotary coating device which coats the high-viscosity photo resist to the semiconductor wafer, by providing the absorption guide pipe to the cover which is put over the coating chamber.
CONSTITUTION: Coating chamber 4 contains drip pan 2 and cover 3, and rotary sample stage 5 which sucks up wafer 6 is provided within pan 2 with cavity axle part 5a linked to the lower part of stage 5 piercing through the bottom surface of pan 2. At the same time, absorption guide tube 7 opening to chamber 4 is provided at the ceiling of cover 3 to be connected to the absorption system. As a result, the linear resist caused at the rotary coating time is sucked up via tube 7 and never sticks to wafer 6 again. Furthermore, the linear resist can be prevented from being dried and scattered to form the dust source.
COPYRIGHT: (C)1979,JPO&Japio
JP4653578A 1978-04-21 1978-04-21 Photo resist coating device Pending JPS54139483A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4653578A JPS54139483A (en) 1978-04-21 1978-04-21 Photo resist coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4653578A JPS54139483A (en) 1978-04-21 1978-04-21 Photo resist coating device

Publications (1)

Publication Number Publication Date
JPS54139483A true JPS54139483A (en) 1979-10-29

Family

ID=12749974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4653578A Pending JPS54139483A (en) 1978-04-21 1978-04-21 Photo resist coating device

Country Status (1)

Country Link
JP (1) JPS54139483A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5669830A (en) * 1979-11-13 1981-06-11 Nec Kyushu Ltd Photo resist processing device for semiconductor device
JPS58101755A (en) * 1981-12-11 1983-06-17 Hitachi Ltd Coater
US5211753A (en) * 1992-06-15 1993-05-18 Swain Danny C Spin coating apparatus with an independently spinning enclosure

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137079A (en) * 1974-04-17 1975-10-30

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137079A (en) * 1974-04-17 1975-10-30

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5669830A (en) * 1979-11-13 1981-06-11 Nec Kyushu Ltd Photo resist processing device for semiconductor device
JPS58101755A (en) * 1981-12-11 1983-06-17 Hitachi Ltd Coater
US5211753A (en) * 1992-06-15 1993-05-18 Swain Danny C Spin coating apparatus with an independently spinning enclosure

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