JPS5413353B2 - - Google Patents

Info

Publication number
JPS5413353B2
JPS5413353B2 JP5607876A JP5607876A JPS5413353B2 JP S5413353 B2 JPS5413353 B2 JP S5413353B2 JP 5607876 A JP5607876 A JP 5607876A JP 5607876 A JP5607876 A JP 5607876A JP S5413353 B2 JPS5413353 B2 JP S5413353B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5607876A
Other languages
Japanese (ja)
Other versions
JPS52139381A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5607876A priority Critical patent/JPS52139381A/ja
Publication of JPS52139381A publication Critical patent/JPS52139381A/ja
Publication of JPS5413353B2 publication Critical patent/JPS5413353B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
JP5607876A 1976-05-18 1976-05-18 Electron beam exposure apparatus Granted JPS52139381A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5607876A JPS52139381A (en) 1976-05-18 1976-05-18 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5607876A JPS52139381A (en) 1976-05-18 1976-05-18 Electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS52139381A JPS52139381A (en) 1977-11-21
JPS5413353B2 true JPS5413353B2 (US07709020-20100504-C00068.png) 1979-05-30

Family

ID=13017040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5607876A Granted JPS52139381A (en) 1976-05-18 1976-05-18 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS52139381A (US07709020-20100504-C00068.png)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54117685A (en) * 1978-03-03 1979-09-12 Toshiba Corp Electron beam exposure unit
JPS54175274U (US07709020-20100504-C00068.png) * 1978-05-30 1979-12-11
JPS54175275U (US07709020-20100504-C00068.png) * 1978-05-30 1979-12-11
JPS553603A (en) * 1978-06-21 1980-01-11 Toshiba Corp Electron beam exposure device
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device
JPS5657037A (en) * 1979-10-15 1981-05-19 Fujitsu Ltd Projection exposing method
JPS5891638A (ja) * 1981-11-26 1983-05-31 Fujitsu Ltd 電子ビ−ム露光方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system

Also Published As

Publication number Publication date
JPS52139381A (en) 1977-11-21

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