JPS54122979A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS54122979A JPS54122979A JP3079678A JP3079678A JPS54122979A JP S54122979 A JPS54122979 A JP S54122979A JP 3079678 A JP3079678 A JP 3079678A JP 3079678 A JP3079678 A JP 3079678A JP S54122979 A JPS54122979 A JP S54122979A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure device
- beam exposure
- electron
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3079678A JPS54122979A (en) | 1978-03-16 | 1978-03-16 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3079678A JPS54122979A (en) | 1978-03-16 | 1978-03-16 | Electron beam exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54122979A true JPS54122979A (en) | 1979-09-22 |
JPS6250975B2 JPS6250975B2 (en, 2012) | 1987-10-28 |
Family
ID=12313635
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3079678A Granted JPS54122979A (en) | 1978-03-16 | 1978-03-16 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54122979A (en, 2012) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56165321A (en) * | 1980-05-23 | 1981-12-18 | Fujitsu Ltd | Electron beam projection system |
JPS57161900U (en, 2012) * | 1981-04-03 | 1982-10-12 | ||
JPS57167626A (en) * | 1981-03-31 | 1982-10-15 | Fujitsu Ltd | Electron beam exposure equipment |
JPS5825751A (ja) * | 1981-08-10 | 1983-02-16 | Nec Corp | 加入者回線試験器 |
JPS59229819A (ja) * | 1983-06-13 | 1984-12-24 | Hitachi Ltd | 電子線描画装置 |
JPS60262420A (ja) * | 1984-06-11 | 1985-12-25 | Nippon Telegr & Teleph Corp <Ntt> | 電子線描画方法及び装置 |
-
1978
- 1978-03-16 JP JP3079678A patent/JPS54122979A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56165321A (en) * | 1980-05-23 | 1981-12-18 | Fujitsu Ltd | Electron beam projection system |
JPS57167626A (en) * | 1981-03-31 | 1982-10-15 | Fujitsu Ltd | Electron beam exposure equipment |
JPS57161900U (en, 2012) * | 1981-04-03 | 1982-10-12 | ||
JPS5825751A (ja) * | 1981-08-10 | 1983-02-16 | Nec Corp | 加入者回線試験器 |
JPS59229819A (ja) * | 1983-06-13 | 1984-12-24 | Hitachi Ltd | 電子線描画装置 |
JPS60262420A (ja) * | 1984-06-11 | 1985-12-25 | Nippon Telegr & Teleph Corp <Ntt> | 電子線描画方法及び装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6250975B2 (en, 2012) | 1987-10-28 |
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