JPS54122979A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS54122979A
JPS54122979A JP3079678A JP3079678A JPS54122979A JP S54122979 A JPS54122979 A JP S54122979A JP 3079678 A JP3079678 A JP 3079678A JP 3079678 A JP3079678 A JP 3079678A JP S54122979 A JPS54122979 A JP S54122979A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
electron
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3079678A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6250975B2 (en, 2012
Inventor
Hisashi Sugiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP3079678A priority Critical patent/JPS54122979A/ja
Publication of JPS54122979A publication Critical patent/JPS54122979A/ja
Publication of JPS6250975B2 publication Critical patent/JPS6250975B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP3079678A 1978-03-16 1978-03-16 Electron beam exposure device Granted JPS54122979A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3079678A JPS54122979A (en) 1978-03-16 1978-03-16 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3079678A JPS54122979A (en) 1978-03-16 1978-03-16 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS54122979A true JPS54122979A (en) 1979-09-22
JPS6250975B2 JPS6250975B2 (en, 2012) 1987-10-28

Family

ID=12313635

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3079678A Granted JPS54122979A (en) 1978-03-16 1978-03-16 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS54122979A (en, 2012)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165321A (en) * 1980-05-23 1981-12-18 Fujitsu Ltd Electron beam projection system
JPS57161900U (en, 2012) * 1981-04-03 1982-10-12
JPS57167626A (en) * 1981-03-31 1982-10-15 Fujitsu Ltd Electron beam exposure equipment
JPS5825751A (ja) * 1981-08-10 1983-02-16 Nec Corp 加入者回線試験器
JPS59229819A (ja) * 1983-06-13 1984-12-24 Hitachi Ltd 電子線描画装置
JPS60262420A (ja) * 1984-06-11 1985-12-25 Nippon Telegr & Teleph Corp <Ntt> 電子線描画方法及び装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165321A (en) * 1980-05-23 1981-12-18 Fujitsu Ltd Electron beam projection system
JPS57167626A (en) * 1981-03-31 1982-10-15 Fujitsu Ltd Electron beam exposure equipment
JPS57161900U (en, 2012) * 1981-04-03 1982-10-12
JPS5825751A (ja) * 1981-08-10 1983-02-16 Nec Corp 加入者回線試験器
JPS59229819A (ja) * 1983-06-13 1984-12-24 Hitachi Ltd 電子線描画装置
JPS60262420A (ja) * 1984-06-11 1985-12-25 Nippon Telegr & Teleph Corp <Ntt> 電子線描画方法及び装置

Also Published As

Publication number Publication date
JPS6250975B2 (en, 2012) 1987-10-28

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