JPS538081A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS538081A JPS538081A JP8148876A JP8148876A JPS538081A JP S538081 A JPS538081 A JP S538081A JP 8148876 A JP8148876 A JP 8148876A JP 8148876 A JP8148876 A JP 8148876A JP S538081 A JPS538081 A JP S538081A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- oxide film
- substrate
- laminating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Semiconductor Memories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8148876A JPS538081A (en) | 1976-07-10 | 1976-07-10 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8148876A JPS538081A (en) | 1976-07-10 | 1976-07-10 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS538081A true JPS538081A (en) | 1978-01-25 |
Family
ID=13747779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8148876A Pending JPS538081A (en) | 1976-07-10 | 1976-07-10 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS538081A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5674939A (en) * | 1979-11-22 | 1981-06-20 | Toshiba Corp | Preparation method of semiconductor integrated circuit |
JPS59181050A (ja) * | 1983-03-31 | 1984-10-15 | Toshiba Corp | 半導体装置及びその製造方法 |
-
1976
- 1976-07-10 JP JP8148876A patent/JPS538081A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5674939A (en) * | 1979-11-22 | 1981-06-20 | Toshiba Corp | Preparation method of semiconductor integrated circuit |
JPS59181050A (ja) * | 1983-03-31 | 1984-10-15 | Toshiba Corp | 半導体装置及びその製造方法 |
JPH0526346B2 (ja) * | 1983-03-31 | 1993-04-15 | Tokyo Shibaura Electric Co |
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