JPS5378186A - Forming method of film conductor - Google Patents

Forming method of film conductor

Info

Publication number
JPS5378186A
JPS5378186A JP15469676A JP15469676A JPS5378186A JP S5378186 A JPS5378186 A JP S5378186A JP 15469676 A JP15469676 A JP 15469676A JP 15469676 A JP15469676 A JP 15469676A JP S5378186 A JPS5378186 A JP S5378186A
Authority
JP
Japan
Prior art keywords
film conductor
electrode
forming method
substrate
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15469676A
Other languages
Japanese (ja)
Inventor
Kiyoshi Takahashi
Shoichi Tsutsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15469676A priority Critical patent/JPS5378186A/en
Publication of JPS5378186A publication Critical patent/JPS5378186A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: The substrate to which a thin film conductor is adhered is mounted on the 2nd substrate, and the 3rd electrode is arranged between the 2nd electrode and the 1st electrode of the metal for the thin film conductor to be generated on it; and the voltage is applied to the 3rd electrode to absorb the electrons generated through the ionization, so that the airtightness will be improved by suppressing the temperature rise of the substrate in sputtering.
COPYRIGHT: (C)1978,JPO&Japio
JP15469676A 1976-12-22 1976-12-22 Forming method of film conductor Pending JPS5378186A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15469676A JPS5378186A (en) 1976-12-22 1976-12-22 Forming method of film conductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15469676A JPS5378186A (en) 1976-12-22 1976-12-22 Forming method of film conductor

Publications (1)

Publication Number Publication Date
JPS5378186A true JPS5378186A (en) 1978-07-11

Family

ID=15589935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15469676A Pending JPS5378186A (en) 1976-12-22 1976-12-22 Forming method of film conductor

Country Status (1)

Country Link
JP (1) JPS5378186A (en)

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