JPS5372460A - Plasma cvd unit - Google Patents
Plasma cvd unitInfo
- Publication number
- JPS5372460A JPS5372460A JP14777176A JP14777176A JPS5372460A JP S5372460 A JPS5372460 A JP S5372460A JP 14777176 A JP14777176 A JP 14777176A JP 14777176 A JP14777176 A JP 14777176A JP S5372460 A JPS5372460 A JP S5372460A
- Authority
- JP
- Japan
- Prior art keywords
- plasma cvd
- cvd unit
- electrode
- unit
- enlarge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14777176A JPS5372460A (en) | 1976-12-10 | 1976-12-10 | Plasma cvd unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14777176A JPS5372460A (en) | 1976-12-10 | 1976-12-10 | Plasma cvd unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5372460A true JPS5372460A (en) | 1978-06-27 |
JPS6132811B2 JPS6132811B2 (enrdf_load_stackoverflow) | 1986-07-29 |
Family
ID=15437800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14777176A Granted JPS5372460A (en) | 1976-12-10 | 1976-12-10 | Plasma cvd unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5372460A (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5562160A (en) * | 1978-11-01 | 1980-05-10 | Canon Inc | Forming method for film by glow discharge |
JPS5675565A (en) * | 1979-11-20 | 1981-06-22 | Sumitomo Electric Ind Ltd | Manufacturing method of thin film |
JPS58104015A (ja) * | 1981-12-11 | 1983-06-21 | Canon Inc | 堆積膜の製造装置 |
JPS5950166A (ja) * | 1982-09-13 | 1984-03-23 | Toshiba Corp | グロ−放電による薄膜形成装置 |
JPS61187375U (enrdf_load_stackoverflow) * | 1985-05-15 | 1986-11-21 | ||
JPH01115235U (enrdf_load_stackoverflow) * | 1988-01-29 | 1989-08-03 | ||
JPH0525647A (ja) * | 1991-02-12 | 1993-02-02 | Fujitsu Ltd | プラズマ気相成長方法 |
JP2009062579A (ja) * | 2007-09-06 | 2009-03-26 | Fuji Electric Systems Co Ltd | 成膜装置 |
-
1976
- 1976-12-10 JP JP14777176A patent/JPS5372460A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5562160A (en) * | 1978-11-01 | 1980-05-10 | Canon Inc | Forming method for film by glow discharge |
JPS5675565A (en) * | 1979-11-20 | 1981-06-22 | Sumitomo Electric Ind Ltd | Manufacturing method of thin film |
JPS58104015A (ja) * | 1981-12-11 | 1983-06-21 | Canon Inc | 堆積膜の製造装置 |
JPS5950166A (ja) * | 1982-09-13 | 1984-03-23 | Toshiba Corp | グロ−放電による薄膜形成装置 |
JPS61187375U (enrdf_load_stackoverflow) * | 1985-05-15 | 1986-11-21 | ||
JPH01115235U (enrdf_load_stackoverflow) * | 1988-01-29 | 1989-08-03 | ||
JPH0525647A (ja) * | 1991-02-12 | 1993-02-02 | Fujitsu Ltd | プラズマ気相成長方法 |
JP2009062579A (ja) * | 2007-09-06 | 2009-03-26 | Fuji Electric Systems Co Ltd | 成膜装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6132811B2 (enrdf_load_stackoverflow) | 1986-07-29 |
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