JPS5368579A - Automatic mask alignment apparatus - Google Patents

Automatic mask alignment apparatus

Info

Publication number
JPS5368579A
JPS5368579A JP14335876A JP14335876A JPS5368579A JP S5368579 A JPS5368579 A JP S5368579A JP 14335876 A JP14335876 A JP 14335876A JP 14335876 A JP14335876 A JP 14335876A JP S5368579 A JPS5368579 A JP S5368579A
Authority
JP
Japan
Prior art keywords
alignment apparatus
mask alignment
automatic mask
targets
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14335876A
Other languages
Japanese (ja)
Other versions
JPS5346697B2 (en
Inventor
Yoji Yabuhara
Mutsuyo Kanetani
Hiroyuki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14335876A priority Critical patent/JPS5368579A/en
Publication of JPS5368579A publication Critical patent/JPS5368579A/en
Publication of JPS5346697B2 publication Critical patent/JPS5346697B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

PURPOSE: To accurately align the targets of a mask and a wafer by beforehand providing targets on a semiconductor wafer and a transparent mask to be placed on this and letting the light reflected from these through the plural slits of a specified shape formed in a rotary drum and detecting the light thus transmitted.
COPYRIGHT: (C)1978,JPO&Japio
JP14335876A 1976-12-01 1976-12-01 Automatic mask alignment apparatus Granted JPS5368579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14335876A JPS5368579A (en) 1976-12-01 1976-12-01 Automatic mask alignment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14335876A JPS5368579A (en) 1976-12-01 1976-12-01 Automatic mask alignment apparatus

Publications (2)

Publication Number Publication Date
JPS5368579A true JPS5368579A (en) 1978-06-19
JPS5346697B2 JPS5346697B2 (en) 1978-12-15

Family

ID=15336919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14335876A Granted JPS5368579A (en) 1976-12-01 1976-12-01 Automatic mask alignment apparatus

Country Status (1)

Country Link
JP (1) JPS5368579A (en)

Also Published As

Publication number Publication date
JPS5346697B2 (en) 1978-12-15

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