JPS5346697B2 - - Google Patents
Info
- Publication number
- JPS5346697B2 JPS5346697B2 JP14335876A JP14335876A JPS5346697B2 JP S5346697 B2 JPS5346697 B2 JP S5346697B2 JP 14335876 A JP14335876 A JP 14335876A JP 14335876 A JP14335876 A JP 14335876A JP S5346697 B2 JPS5346697 B2 JP S5346697B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14335876A JPS5368579A (en) | 1976-12-01 | 1976-12-01 | Automatic mask alignment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14335876A JPS5368579A (en) | 1976-12-01 | 1976-12-01 | Automatic mask alignment apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5368579A JPS5368579A (en) | 1978-06-19 |
| JPS5346697B2 true JPS5346697B2 (en) | 1978-12-15 |
Family
ID=15336919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14335876A Granted JPS5368579A (en) | 1976-12-01 | 1976-12-01 | Automatic mask alignment apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5368579A (en) |
-
1976
- 1976-12-01 JP JP14335876A patent/JPS5368579A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5368579A (en) | 1978-06-19 |