JPS5338592B2 - - Google Patents
Info
- Publication number
- JPS5338592B2 JPS5338592B2 JP3522576A JP3522576A JPS5338592B2 JP S5338592 B2 JPS5338592 B2 JP S5338592B2 JP 3522576 A JP3522576 A JP 3522576A JP 3522576 A JP3522576 A JP 3522576A JP S5338592 B2 JPS5338592 B2 JP S5338592B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P70/00—Cleaning of wafers, substrates or parts of devices
- H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2526052A DE2526052C2 (de) | 1975-06-11 | 1975-06-11 | Verfahren zum Reinigen polierter Halbleiterscheiben |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51150972A JPS51150972A (en) | 1976-12-24 |
| JPS5338592B2 true JPS5338592B2 (online.php) | 1978-10-16 |
Family
ID=5948838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51035225A Granted JPS51150972A (en) | 1975-06-11 | 1976-04-01 | Process for cleaning semiconductor substrate polished |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS51150972A (online.php) |
| BE (1) | BE842810A (online.php) |
| DE (1) | DE2526052C2 (online.php) |
| DK (1) | DK144776A (online.php) |
| GB (1) | GB1553695A (online.php) |
| IT (1) | IT1061334B (online.php) |
| NL (1) | NL7603267A (online.php) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4129457A (en) * | 1977-05-23 | 1978-12-12 | International Business Machines Corporation | Post-polishing cleaning of semiconductor surfaces |
| JPS6040705B2 (ja) * | 1978-06-26 | 1985-09-12 | インタ−ナシヨナル・ビジネス・マシ−ンンズ・コ−ポレ−シヨン | 電子回路の保護被覆形成方法 |
| DE3328639A1 (de) * | 1983-08-09 | 1985-02-21 | Merck Patent Gmbh, 6100 Darmstadt | Reinigungsmittel fuer mechanisch bearbeitete halbleitermaterialien |
| JPS60126838A (ja) * | 1983-12-13 | 1985-07-06 | Mitsubishi Monsanto Chem Co | ひ化ガリウム単結晶ウエハの洗滌液および洗滌方法 |
| DE3834396A1 (de) * | 1988-10-10 | 1990-04-12 | Telefunken Electronic Gmbh | Verfahren zum entfernen von oberflaechenschichten |
| DE4103084A1 (de) * | 1991-02-01 | 1992-08-13 | Wacker Chemitronic | Magazin zur halterung von scheibenfoermigen werkstuecken, insbesondere halbleiterscheiben, bei der nasschemischen oberflaechenbehandlung in fluessigkeitsbaedern |
| US5320706A (en) * | 1991-10-15 | 1994-06-14 | Texas Instruments Incorporated | Removing slurry residue from semiconductor wafer planarization |
| US5911889A (en) * | 1995-05-11 | 1999-06-15 | Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Aktiengesellschaft | Method of removing damaged crystal regions from silicon wafers |
| US6074935A (en) * | 1997-06-25 | 2000-06-13 | Siemens Aktiengesellschaft | Method of reducing the formation of watermarks on semiconductor wafers |
| RU2219002C1 (ru) * | 2002-04-08 | 2003-12-20 | Панчеха Юрий Степанович | Способ очистки изделий |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3342652A (en) * | 1964-04-02 | 1967-09-19 | Ibm | Chemical polishing of a semi-conductor substrate |
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1975
- 1975-06-11 DE DE2526052A patent/DE2526052C2/de not_active Expired
-
1976
- 1976-03-29 NL NL7603267A patent/NL7603267A/xx not_active Application Discontinuation
- 1976-03-30 DK DK144776A patent/DK144776A/da not_active Application Discontinuation
- 1976-04-01 JP JP51035225A patent/JPS51150972A/ja active Granted
- 1976-06-09 IT IT49850/76A patent/IT1061334B/it active
- 1976-06-10 GB GB24059/76A patent/GB1553695A/en not_active Expired
- 1976-06-10 BE BE167808A patent/BE842810A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51150972A (en) | 1976-12-24 |
| IT1061334B (it) | 1983-02-28 |
| BE842810A (fr) | 1976-12-10 |
| DE2526052C2 (de) | 1983-04-21 |
| NL7603267A (nl) | 1976-12-14 |
| DE2526052A1 (de) | 1976-12-30 |
| GB1553695A (en) | 1979-09-26 |
| DK144776A (da) | 1976-12-12 |