GB1553695A - Cleaning semiconductor dics - Google Patents

Cleaning semiconductor dics

Info

Publication number
GB1553695A
GB1553695A GB2405976A GB2405976A GB1553695A GB 1553695 A GB1553695 A GB 1553695A GB 2405976 A GB2405976 A GB 2405976A GB 2405976 A GB2405976 A GB 2405976A GB 1553695 A GB1553695 A GB 1553695A
Authority
GB
United Kingdom
Prior art keywords
dics
cleaning semiconductor
cleaning
semiconductor
semiconductor dics
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2405976A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Publication of GB1553695A publication Critical patent/GB1553695A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Detergent Compositions (AREA)
GB2405976A 1975-06-11 1976-06-10 Cleaning semiconductor dics Expired GB1553695A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752526052 DE2526052C2 (en) 1975-06-11 1975-06-11 Process for cleaning polished semiconductor wafers

Publications (1)

Publication Number Publication Date
GB1553695A true GB1553695A (en) 1979-09-26

Family

ID=5948838

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2405976A Expired GB1553695A (en) 1975-06-11 1976-06-10 Cleaning semiconductor dics

Country Status (7)

Country Link
JP (1) JPS51150972A (en)
BE (1) BE842810A (en)
DE (1) DE2526052C2 (en)
DK (1) DK144776A (en)
GB (1) GB1553695A (en)
IT (1) IT1061334B (en)
NL (1) NL7603267A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4129457A (en) * 1977-05-23 1978-12-12 International Business Machines Corporation Post-polishing cleaning of semiconductor surfaces
JPS6040705B2 (en) * 1978-06-26 1985-09-12 インタ−ナシヨナル・ビジネス・マシ−ンンズ・コ−ポレ−シヨン Method of forming protective coating for electronic circuits
DE3328639A1 (en) * 1983-08-09 1985-02-21 Merck Patent Gmbh, 6100 Darmstadt CLEANING AGENT FOR MECHANICALLY PROCESSED SEMICONDUCTOR MATERIALS
JPS60126838A (en) * 1983-12-13 1985-07-06 Mitsubishi Monsanto Chem Co Cleaning fluid for gallium arsenide single crystal wafer and cleaning method thereof
DE3834396A1 (en) * 1988-10-10 1990-04-12 Telefunken Electronic Gmbh Method for removing surface layers
DE4103084A1 (en) * 1991-02-01 1992-08-13 Wacker Chemitronic MAGAZINE FOR THE HOLDING OF DISK-SHAPED WORKPIECES, IN PARTICULAR SEMICONDUCTOR DISC, FOR WET-CHEMICAL SURFACE TREATMENT IN LIQUID BATHROOMS
US5320706A (en) * 1991-10-15 1994-06-14 Texas Instruments Incorporated Removing slurry residue from semiconductor wafer planarization
US5911889A (en) * 1995-05-11 1999-06-15 Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Aktiengesellschaft Method of removing damaged crystal regions from silicon wafers
US6074935A (en) * 1997-06-25 2000-06-13 Siemens Aktiengesellschaft Method of reducing the formation of watermarks on semiconductor wafers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3342652A (en) * 1964-04-02 1967-09-19 Ibm Chemical polishing of a semi-conductor substrate

Also Published As

Publication number Publication date
JPS51150972A (en) 1976-12-24
DK144776A (en) 1976-12-12
DE2526052A1 (en) 1976-12-30
NL7603267A (en) 1976-12-14
DE2526052C2 (en) 1983-04-21
BE842810A (en) 1976-12-10
JPS5338592B2 (en) 1978-10-16
IT1061334B (en) 1983-02-28

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee