IT1061334B - PROCEDURE FOR THE CLEANING OF POLISHED SEMICONDUCTIVE DISCS - Google Patents
PROCEDURE FOR THE CLEANING OF POLISHED SEMICONDUCTIVE DISCSInfo
- Publication number
- IT1061334B IT1061334B IT4985076A IT4985076A IT1061334B IT 1061334 B IT1061334 B IT 1061334B IT 4985076 A IT4985076 A IT 4985076A IT 4985076 A IT4985076 A IT 4985076A IT 1061334 B IT1061334 B IT 1061334B
- Authority
- IT
- Italy
- Prior art keywords
- semiconductive
- polished
- discs
- cleaning
- procedure
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Weting (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19752526052 DE2526052C2 (en) | 1975-06-11 | 1975-06-11 | Process for cleaning polished semiconductor wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1061334B true IT1061334B (en) | 1983-02-28 |
Family
ID=5948838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT4985076A IT1061334B (en) | 1975-06-11 | 1976-06-09 | PROCEDURE FOR THE CLEANING OF POLISHED SEMICONDUCTIVE DISCS |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS51150972A (en) |
| BE (1) | BE842810A (en) |
| DE (1) | DE2526052C2 (en) |
| DK (1) | DK144776A (en) |
| GB (1) | GB1553695A (en) |
| IT (1) | IT1061334B (en) |
| NL (1) | NL7603267A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4129457A (en) * | 1977-05-23 | 1978-12-12 | International Business Machines Corporation | Post-polishing cleaning of semiconductor surfaces |
| JPS6040705B2 (en) * | 1978-06-26 | 1985-09-12 | インタ−ナシヨナル・ビジネス・マシ−ンンズ・コ−ポレ−シヨン | Method of forming protective coating for electronic circuits |
| DE3328639A1 (en) * | 1983-08-09 | 1985-02-21 | Merck Patent Gmbh, 6100 Darmstadt | CLEANING AGENT FOR MECHANICALLY PROCESSED SEMICONDUCTOR MATERIALS |
| JPS60126838A (en) * | 1983-12-13 | 1985-07-06 | Mitsubishi Monsanto Chem Co | Cleaning fluid for gallium arsenide single crystal wafer and cleaning method thereof |
| DE3834396A1 (en) * | 1988-10-10 | 1990-04-12 | Telefunken Electronic Gmbh | Method for removing surface layers |
| DE4103084A1 (en) * | 1991-02-01 | 1992-08-13 | Wacker Chemitronic | MAGAZINE FOR THE HOLDING OF DISK-SHAPED WORKPIECES, IN PARTICULAR SEMICONDUCTOR DISC, FOR WET-CHEMICAL SURFACE TREATMENT IN LIQUID BATHROOMS |
| US5320706A (en) * | 1991-10-15 | 1994-06-14 | Texas Instruments Incorporated | Removing slurry residue from semiconductor wafer planarization |
| US5911889A (en) * | 1995-05-11 | 1999-06-15 | Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Aktiengesellschaft | Method of removing damaged crystal regions from silicon wafers |
| US6074935A (en) * | 1997-06-25 | 2000-06-13 | Siemens Aktiengesellschaft | Method of reducing the formation of watermarks on semiconductor wafers |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3342652A (en) * | 1964-04-02 | 1967-09-19 | Ibm | Chemical polishing of a semi-conductor substrate |
-
1975
- 1975-06-11 DE DE19752526052 patent/DE2526052C2/en not_active Expired
-
1976
- 1976-03-29 NL NL7603267A patent/NL7603267A/en not_active Application Discontinuation
- 1976-03-30 DK DK144776A patent/DK144776A/en not_active Application Discontinuation
- 1976-04-01 JP JP3522576A patent/JPS51150972A/en active Granted
- 1976-06-09 IT IT4985076A patent/IT1061334B/en active
- 1976-06-10 GB GB2405976A patent/GB1553695A/en not_active Expired
- 1976-06-10 BE BE167808A patent/BE842810A/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| NL7603267A (en) | 1976-12-14 |
| DK144776A (en) | 1976-12-12 |
| DE2526052C2 (en) | 1983-04-21 |
| JPS5338592B2 (en) | 1978-10-16 |
| GB1553695A (en) | 1979-09-26 |
| BE842810A (en) | 1976-12-10 |
| JPS51150972A (en) | 1976-12-24 |
| DE2526052A1 (en) | 1976-12-30 |
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