JPS5324792B2 - - Google Patents
Info
- Publication number
- JPS5324792B2 JPS5324792B2 JP4611977A JP4611977A JPS5324792B2 JP S5324792 B2 JPS5324792 B2 JP S5324792B2 JP 4611977 A JP4611977 A JP 4611977A JP 4611977 A JP4611977 A JP 4611977A JP S5324792 B2 JPS5324792 B2 JP S5324792B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4611977A JPS52120686A (en) | 1977-04-21 | 1977-04-21 | Electronic ray exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4611977A JPS52120686A (en) | 1977-04-21 | 1977-04-21 | Electronic ray exposure method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3764176A Division JPS52122083A (en) | 1976-04-02 | 1976-04-02 | Electron beam exposing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52120686A JPS52120686A (en) | 1977-10-11 |
| JPS5324792B2 true JPS5324792B2 (enExample) | 1978-07-22 |
Family
ID=12738097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4611977A Granted JPS52120686A (en) | 1977-04-21 | 1977-04-21 | Electronic ray exposure method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52120686A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5543821A (en) * | 1978-09-22 | 1980-03-27 | Hitachi Ltd | Electronic drawing device |
| JPS55146931A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Depicting method by electronic beam |
| JPS5746835U (enExample) * | 1980-08-29 | 1982-03-16 | ||
| JPS5748230A (en) * | 1980-09-04 | 1982-03-19 | Jeol Ltd | Electron ray exposure |
| DE3169257D1 (en) * | 1980-11-28 | 1985-04-18 | Ibm | Electron beam system and method |
| JPS56153739A (en) * | 1981-04-09 | 1981-11-27 | Fujitsu Ltd | Exposing method for electron beam |
| JP4583936B2 (ja) * | 2005-01-06 | 2010-11-17 | 日本電子株式会社 | 荷電粒子ビーム装置及び荷電粒子ビーム装置の制御方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5235545B2 (enExample) * | 1973-05-02 | 1977-09-09 | ||
| US3914608A (en) * | 1973-12-19 | 1975-10-21 | Westinghouse Electric Corp | Rapid exposure of micropatterns with a scanning electron microscope |
| JPS52122083A (en) * | 1976-04-02 | 1977-10-13 | Jeol Ltd | Electron beam exposing device |
-
1977
- 1977-04-21 JP JP4611977A patent/JPS52120686A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52120686A (en) | 1977-10-11 |