JPS5315078A - Method of automatically adjusting layer material - Google Patents
Method of automatically adjusting layer materialInfo
- Publication number
- JPS5315078A JPS5315078A JP8876677A JP8876677A JPS5315078A JP S5315078 A JPS5315078 A JP S5315078A JP 8876677 A JP8876677 A JP 8876677A JP 8876677 A JP8876677 A JP 8876677A JP S5315078 A JPS5315078 A JP S5315078A
- Authority
- JP
- Japan
- Prior art keywords
- layer material
- automatically adjusting
- adjusting layer
- automatically
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762633297 DE2633297A1 (de) | 1976-07-23 | 1976-07-23 | Verfahren zur automatischen justierung |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5315078A true JPS5315078A (en) | 1978-02-10 |
Family
ID=5983818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8876677A Pending JPS5315078A (en) | 1976-07-23 | 1977-07-22 | Method of automatically adjusting layer material |
Country Status (8)
Country | Link |
---|---|
US (1) | US4127777A (ja) |
JP (1) | JPS5315078A (ja) |
BE (1) | BE857044R (ja) |
DE (1) | DE2633297A1 (ja) |
FR (1) | FR2359439A2 (ja) |
GB (1) | GB1589285A (ja) |
IT (1) | IT1113774B (ja) |
NL (1) | NL7708183A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5875834A (ja) * | 1981-10-30 | 1983-05-07 | Hitachi Ltd | プロキシミティ露光装置 |
JPS6021051A (ja) * | 1983-07-14 | 1985-02-02 | Nippon Telegr & Teleph Corp <Ntt> | レンズ投影露光方法及び装置 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54114182A (en) * | 1978-02-27 | 1979-09-06 | Canon Inc | Alingment device |
JPS54114181A (en) * | 1978-02-27 | 1979-09-06 | Canon Inc | Alignment device |
JPS54157478A (en) * | 1978-06-01 | 1979-12-12 | Canon Inc | Alignment method |
DE2905636C2 (de) * | 1979-02-14 | 1985-06-20 | Censor Patent- Und Versuchs-Anstalt, Vaduz | Verfahren zum Kopieren von Masken auf ein Werkstück |
DE2905635A1 (de) * | 1979-02-14 | 1980-08-21 | Censor Patent Versuch | Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen |
US4390279A (en) * | 1979-07-12 | 1983-06-28 | Nippon Kogaku K. K. | Alignment device in an IC projection exposure apparatus |
JPS56130707A (en) * | 1980-03-18 | 1981-10-13 | Canon Inc | Photo-printing device |
US4326805A (en) * | 1980-04-11 | 1982-04-27 | Bell Telephone Laboratories, Incorporated | Method and apparatus for aligning mask and wafer members |
JPS57138134A (en) * | 1981-02-20 | 1982-08-26 | Nippon Kogaku Kk <Nikon> | Positioning device |
JPS58108745A (ja) * | 1981-12-23 | 1983-06-28 | Canon Inc | 転写装置 |
US4580900A (en) * | 1982-04-02 | 1986-04-08 | Eaton Corporation | Auto focus alignment and measurement system and method |
US4615621A (en) * | 1982-04-02 | 1986-10-07 | Eaton Corporation | Auto-focus alignment and measurement system and method |
JPH0666241B2 (ja) * | 1985-10-14 | 1994-08-24 | 株式会社日立製作所 | 位置検出方法 |
JPS63220521A (ja) * | 1987-03-10 | 1988-09-13 | Canon Inc | 焦点合せ装置 |
US5218415A (en) * | 1988-05-31 | 1993-06-08 | Canon Kabushiki Kaisha | Device for optically detecting inclination of a surface |
JPH02292813A (ja) * | 1989-05-02 | 1990-12-04 | Canon Inc | 自動焦点合せ装置 |
US6232999B1 (en) * | 1999-06-25 | 2001-05-15 | Eastman Kodak Company | Method for changing focus and angle of a multichannel printhead |
US7679029B2 (en) * | 2005-10-28 | 2010-03-16 | Cymer, Inc. | Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations |
CN104237072B (zh) * | 2014-09-01 | 2016-08-24 | 中华人民共和国北仑出入境检验检疫局 | 一种粘度计毛细管的自动调直装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2050590C2 (de) * | 1970-10-15 | 1982-06-16 | Ibm Deutschland Gmbh, 7000 Stuttgart | Projektionseinrichtung |
US4070117A (en) * | 1972-06-12 | 1978-01-24 | Kasper Instruments, Inc. | Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask |
US3867038A (en) * | 1972-11-27 | 1975-02-18 | Baird Atomic Inc | Optical alignment system |
DE2460914C2 (de) * | 1974-12-21 | 1983-08-18 | Ibm Deutschland Gmbh, 7000 Stuttgart | Photolithographische Projektionsvorrichtung |
-
1976
- 1976-07-23 DE DE19762633297 patent/DE2633297A1/de not_active Ceased
-
1977
- 1977-07-13 US US05/815,215 patent/US4127777A/en not_active Expired - Lifetime
- 1977-07-19 FR FR7722057A patent/FR2359439A2/fr active Pending
- 1977-07-21 IT IT25949/77A patent/IT1113774B/it active
- 1977-07-22 NL NL7708183A patent/NL7708183A/xx not_active Application Discontinuation
- 1977-07-22 JP JP8876677A patent/JPS5315078A/ja active Pending
- 1977-07-22 GB GB30823/77A patent/GB1589285A/en not_active Expired
- 1977-07-22 BE BE179551A patent/BE857044R/xx active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5875834A (ja) * | 1981-10-30 | 1983-05-07 | Hitachi Ltd | プロキシミティ露光装置 |
JPH0311540B2 (ja) * | 1981-10-30 | 1991-02-18 | Hitachi Ltd | |
JPS6021051A (ja) * | 1983-07-14 | 1985-02-02 | Nippon Telegr & Teleph Corp <Ntt> | レンズ投影露光方法及び装置 |
JPH037138B2 (ja) * | 1983-07-14 | 1991-01-31 | Nippon Telegraph & Telephone |
Also Published As
Publication number | Publication date |
---|---|
FR2359439A2 (fr) | 1978-02-17 |
GB1589285A (en) | 1981-05-07 |
DE2633297A1 (de) | 1978-01-26 |
BE857044R (fr) | 1977-11-14 |
NL7708183A (nl) | 1978-01-25 |
US4127777A (en) | 1978-11-28 |
IT1113774B (it) | 1986-01-20 |
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