BE857044R - Procede pour realiser l'ajustement automatique de pastilles semiconductrices - Google Patents

Procede pour realiser l'ajustement automatique de pastilles semiconductrices

Info

Publication number
BE857044R
BE857044R BE179551A BE179551A BE857044R BE 857044 R BE857044 R BE 857044R BE 179551 A BE179551 A BE 179551A BE 179551 A BE179551 A BE 179551A BE 857044 R BE857044 R BE 857044R
Authority
BE
Belgium
Prior art keywords
carrying
automatic adjustment
semiconductor pellets
pellets
semiconductor
Prior art date
Application number
BE179551A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of BE857044R publication Critical patent/BE857044R/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
BE179551A 1976-07-23 1977-07-22 Procede pour realiser l'ajustement automatique de pastilles semiconductrices BE857044R (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762633297 DE2633297A1 (de) 1976-07-23 1976-07-23 Verfahren zur automatischen justierung

Publications (1)

Publication Number Publication Date
BE857044R true BE857044R (fr) 1977-11-14

Family

ID=5983818

Family Applications (1)

Application Number Title Priority Date Filing Date
BE179551A BE857044R (fr) 1976-07-23 1977-07-22 Procede pour realiser l'ajustement automatique de pastilles semiconductrices

Country Status (8)

Country Link
US (1) US4127777A (fr)
JP (1) JPS5315078A (fr)
BE (1) BE857044R (fr)
DE (1) DE2633297A1 (fr)
FR (1) FR2359439A2 (fr)
GB (1) GB1589285A (fr)
IT (1) IT1113774B (fr)
NL (1) NL7708183A (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54114182A (en) * 1978-02-27 1979-09-06 Canon Inc Alingment device
JPS54114181A (en) * 1978-02-27 1979-09-06 Canon Inc Alignment device
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
DE2905635A1 (de) * 1979-02-14 1980-08-21 Censor Patent Versuch Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen
US4390279A (en) * 1979-07-12 1983-06-28 Nippon Kogaku K. K. Alignment device in an IC projection exposure apparatus
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS5875834A (ja) * 1981-10-30 1983-05-07 Hitachi Ltd プロキシミティ露光装置
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
US4615621A (en) * 1982-04-02 1986-10-07 Eaton Corporation Auto-focus alignment and measurement system and method
JPS6021051A (ja) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> レンズ投影露光方法及び装置
JPH0666241B2 (ja) * 1985-10-14 1994-08-24 株式会社日立製作所 位置検出方法
JPS63220521A (ja) * 1987-03-10 1988-09-13 Canon Inc 焦点合せ装置
US5218415A (en) * 1988-05-31 1993-06-08 Canon Kabushiki Kaisha Device for optically detecting inclination of a surface
JPH02292813A (ja) * 1989-05-02 1990-12-04 Canon Inc 自動焦点合せ装置
US6232999B1 (en) * 1999-06-25 2001-05-15 Eastman Kodak Company Method for changing focus and angle of a multichannel printhead
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
CN104237072B (zh) * 2014-09-01 2016-08-24 中华人民共和国北仑出入境检验检疫局 一种粘度计毛细管的自动调直装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2050590C2 (de) * 1970-10-15 1982-06-16 Ibm Deutschland Gmbh, 7000 Stuttgart Projektionseinrichtung
US4070117A (en) * 1972-06-12 1978-01-24 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask
US3867038A (en) * 1972-11-27 1975-02-18 Baird Atomic Inc Optical alignment system
DE2460914C2 (de) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographische Projektionsvorrichtung

Also Published As

Publication number Publication date
NL7708183A (nl) 1978-01-25
GB1589285A (en) 1981-05-07
JPS5315078A (en) 1978-02-10
US4127777A (en) 1978-11-28
IT1113774B (it) 1986-01-20
FR2359439A2 (fr) 1978-02-17
DE2633297A1 (de) 1978-01-26

Similar Documents

Publication Publication Date Title
BE857044R (fr) Procede pour realiser l&#39;ajustement automatique de pastilles semiconductrices
BE845853A (fr) Procede pour realiser l&#39;ajustement automatique de pastilles semiconductrices
BE839972A (fr) Procede pour la fabrication d&#39;un dispositif semiconducteur
FR2484702B1 (fr) Procede pour la fabrication de jonction pn de semi-conducteurs
BE843220A (fr) Procede pour maitriser le developpement d&#39;algues
RO70854A (fr) Procede pour la preparation des metha-aryloxybenzaldehydes
BE862106A (fr) Procede de preparation d&#39;electro-corindon fondu
RO74430A (fr) Procede ameliore pour la fabrication de 2-ethylhexanol
BE851989A (fr) Procede pour proteger les plantes d&#39;un rayonnement solaire excessif
FR2336971A1 (fr) Procede de formation de monocristaux d&#39;halogenures alcalins
BE850383A (fr) Procede ameliore pour le dosage de l&#39;alcoolemie
BE859479A (fr) Procede de fabrication d&#39;orthoacetates d&#39;alcoyle
BE859325A (fr) Procede pour la chloration dirigee d&#39;alcoylbenzenes
CH611100B (fr) Procede pour ameliorer la mouillabilite a l&#39;eau des polyolefines.
BE875567A (fr) Procede pour la production de copolymeres de l&#39;ethylene
RO71572A (fr) Procede pour la preparation des oxycarbamates n-sulphenyles
BE877195A (fr) Procede pour l&#39;elimination selective des impuretes
RO71066A (fr) Procede pour la preparation des 2-chlorsulfinylazetidin-4-ones
BE881022A (fr) Dispositif pour la fabrication de boites
FR2348177A1 (fr) Procede pour l&#39;orthoalcoylation des phenols
RO72900A (fr) Procede pour la preparation des cis-4a-phenyloctahydro-1h-2-pyrindines
FR2276128A1 (fr) Dispositif d&#39;avance-barre pour tour automatique
RO72831A (fr) Procede pour la preparation des fenilpyperazines
RO76163A (fr) Procede pour 11beta-hydroxysteroides
BE852208A (fr) Procede ameliore pour la preparation de compositions nutrives