IT1113774B - Procedimento per l'aggiustaggio automatico di materiali a strati,specialmente di piastre di materiale semiconduttore - Google Patents

Procedimento per l'aggiustaggio automatico di materiali a strati,specialmente di piastre di materiale semiconduttore

Info

Publication number
IT1113774B
IT1113774B IT25949/77A IT2594977A IT1113774B IT 1113774 B IT1113774 B IT 1113774B IT 25949/77 A IT25949/77 A IT 25949/77A IT 2594977 A IT2594977 A IT 2594977A IT 1113774 B IT1113774 B IT 1113774B
Authority
IT
Italy
Prior art keywords
procedure
automatic adjustment
layer materials
semiconductive material
material plates
Prior art date
Application number
IT25949/77A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1113774B publication Critical patent/IT1113774B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
IT25949/77A 1976-07-23 1977-07-21 Procedimento per l'aggiustaggio automatico di materiali a strati,specialmente di piastre di materiale semiconduttore IT1113774B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762633297 DE2633297A1 (de) 1976-07-23 1976-07-23 Verfahren zur automatischen justierung

Publications (1)

Publication Number Publication Date
IT1113774B true IT1113774B (it) 1986-01-20

Family

ID=5983818

Family Applications (1)

Application Number Title Priority Date Filing Date
IT25949/77A IT1113774B (it) 1976-07-23 1977-07-21 Procedimento per l'aggiustaggio automatico di materiali a strati,specialmente di piastre di materiale semiconduttore

Country Status (8)

Country Link
US (1) US4127777A (it)
JP (1) JPS5315078A (it)
BE (1) BE857044R (it)
DE (1) DE2633297A1 (it)
FR (1) FR2359439A2 (it)
GB (1) GB1589285A (it)
IT (1) IT1113774B (it)
NL (1) NL7708183A (it)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54114181A (en) * 1978-02-27 1979-09-06 Canon Inc Alignment device
JPS54114182A (en) * 1978-02-27 1979-09-06 Canon Inc Alingment device
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
DE2905635C2 (de) * 1979-02-14 1987-01-22 Perkin-Elmer Censor Anstalt, Vaduz Einrichtung zum Positionieren eines Werkstückes in Z-Richtung beim Projektionskopieren
US4390279A (en) * 1979-07-12 1983-06-28 Nippon Kogaku K. K. Alignment device in an IC projection exposure apparatus
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS5875834A (ja) * 1981-10-30 1983-05-07 Hitachi Ltd プロキシミティ露光装置
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
US4615621A (en) * 1982-04-02 1986-10-07 Eaton Corporation Auto-focus alignment and measurement system and method
JPS6021051A (ja) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> レンズ投影露光方法及び装置
JPH0666241B2 (ja) * 1985-10-14 1994-08-24 株式会社日立製作所 位置検出方法
JPS63220521A (ja) * 1987-03-10 1988-09-13 Canon Inc 焦点合せ装置
US5218415A (en) * 1988-05-31 1993-06-08 Canon Kabushiki Kaisha Device for optically detecting inclination of a surface
JPH02292813A (ja) * 1989-05-02 1990-12-04 Canon Inc 自動焦点合せ装置
US6232999B1 (en) * 1999-06-25 2001-05-15 Eastman Kodak Company Method for changing focus and angle of a multichannel printhead
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
CN104237072B (zh) * 2014-09-01 2016-08-24 中华人民共和国北仑出入境检验检疫局 一种粘度计毛细管的自动调直装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2050590C2 (de) * 1970-10-15 1982-06-16 Ibm Deutschland Gmbh, 7000 Stuttgart Projektionseinrichtung
US4070117A (en) * 1972-06-12 1978-01-24 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask
US3867038A (en) * 1972-11-27 1975-02-18 Baird Atomic Inc Optical alignment system
DE2460914C2 (de) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographische Projektionsvorrichtung

Also Published As

Publication number Publication date
JPS5315078A (en) 1978-02-10
GB1589285A (en) 1981-05-07
BE857044R (fr) 1977-11-14
FR2359439A2 (fr) 1978-02-17
US4127777A (en) 1978-11-28
DE2633297A1 (de) 1978-01-26
NL7708183A (nl) 1978-01-25

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