BE845853A - Procede pour realiser l'ajustement automatique de pastilles semiconductrices - Google Patents

Procede pour realiser l'ajustement automatique de pastilles semiconductrices

Info

Publication number
BE845853A
BE845853A BE170354A BE170354A BE845853A BE 845853 A BE845853 A BE 845853A BE 170354 A BE170354 A BE 170354A BE 170354 A BE170354 A BE 170354A BE 845853 A BE845853 A BE 845853A
Authority
BE
Belgium
Prior art keywords
carrying
automatic adjustment
semiconductor pellets
pellets
semiconductor
Prior art date
Application number
BE170354A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE845853A publication Critical patent/BE845853A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/2633—Bombardment with radiation with high-energy radiation for etching, e.g. sputteretching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30608—Anisotropic liquid etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
BE170354A 1975-09-03 1976-09-03 Procede pour realiser l'ajustement automatique de pastilles semiconductrices BE845853A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752539206 DE2539206A1 (de) 1975-09-03 1975-09-03 Verfahren zur automatischen justierung von halbleiterscheiben

Publications (1)

Publication Number Publication Date
BE845853A true BE845853A (fr) 1976-12-31

Family

ID=5955513

Family Applications (1)

Application Number Title Priority Date Filing Date
BE170354A BE845853A (fr) 1975-09-03 1976-09-03 Procede pour realiser l'ajustement automatique de pastilles semiconductrices

Country Status (8)

Country Link
US (1) US4090068A (fr)
JP (1) JPS5230384A (fr)
BE (1) BE845853A (fr)
DE (1) DE2539206A1 (fr)
FR (1) FR2323177A1 (fr)
GB (1) GB1531909A (fr)
IT (1) IT1065238B (fr)
NL (1) NL7609733A (fr)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1125000B (it) * 1978-12-08 1986-05-14 Rca Corp Sistema automatico per l'allineamento di fotomaschere in processi di stampa a proiezione
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
JPS566437A (en) * 1979-06-26 1981-01-23 Chiyou Lsi Gijutsu Kenkyu Kumiai Alignment
DE2942990A1 (de) * 1979-10-24 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zur automatischen justierung von strukturen in zwei parallelen ebenen, insbesondere bei der herstellung von integrierten halbleiterschaltungen
JPS5673437A (en) * 1979-11-20 1981-06-18 Fujitsu Ltd Far-ultraviolet light exposing method and device
FR2504281A1 (fr) * 1981-04-16 1982-10-22 Euromask Appareil de projection a dispositif de mise au point
JPS58102939A (ja) * 1981-12-15 1983-06-18 Canon Inc マスクアライナ−用マスク及びマスクアライナ−
DE3212190A1 (de) * 1982-04-01 1983-10-06 Siemens Ag Opto-elektronische unterscheidung von strukturen auf oberflaechen
GB2129124B (en) * 1982-10-16 1985-12-11 Ferranti Plc Aligning mask with body
GB2137746A (en) * 1983-04-05 1984-10-10 Hewlett Packard Co Apparatus for Detecting Deviations of Position from a Reference
EP0148477B1 (fr) * 1983-12-26 1991-09-04 Hitachi, Ltd. Appareil d'exposition ainsi que méthode d'alignement d'un masque avec une pièce de travail
GB2159939A (en) * 1984-03-02 1985-12-11 Hewlett Packard Co Detector apparatus
US4701050A (en) * 1984-08-10 1987-10-20 Hitachi, Ltd. Semiconductor exposure apparatus and alignment method therefor
JPS61171136A (ja) * 1985-01-25 1986-08-01 Toshiba Corp 半導体結晶のメサエツチング方法
JPH0722179B2 (ja) * 1985-12-27 1995-03-08 日本電気株式会社 半導体ウエ−ハの位置合せマ−クの形成方法
JPH0685387B2 (ja) * 1986-02-14 1994-10-26 株式会社東芝 位置合わせ方法
JPH0754793B2 (ja) * 1986-04-21 1995-06-07 株式会社ニコン 投影露光装置
JPH0338820A (ja) * 1989-07-05 1991-02-19 Seiko Instr Inc 半導体装置の製造方法
JPH06154453A (ja) * 1992-11-26 1994-06-03 Barudan Co Ltd ミシン
DE19939825A1 (de) * 1999-08-21 2001-03-01 Bosch Gmbh Robert Bauelement mit einem optisch erkennbaren Marker

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope
US3885877A (en) * 1973-10-11 1975-05-27 Ibm Electro-optical fine alignment process

Also Published As

Publication number Publication date
US4090068A (en) 1978-05-16
IT1065238B (it) 1985-02-25
JPS5230384A (en) 1977-03-08
DE2539206A1 (de) 1977-03-17
GB1531909A (en) 1978-11-15
NL7609733A (nl) 1977-03-07
FR2323177A1 (fr) 1977-04-01

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