JPS53147637A - Etching method and apparatus for same - Google Patents
Etching method and apparatus for sameInfo
- Publication number
- JPS53147637A JPS53147637A JP6368677A JP6368677A JPS53147637A JP S53147637 A JPS53147637 A JP S53147637A JP 6368677 A JP6368677 A JP 6368677A JP 6368677 A JP6368677 A JP 6368677A JP S53147637 A JPS53147637 A JP S53147637A
- Authority
- JP
- Japan
- Prior art keywords
- same
- etching method
- moleculaes
- hitting
- incidence
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To accomplish ultra fine working by hitting a work with chemically active atoms, moleculaes or gases excited to ions in a specific direction of incidence so as to prevent side etching.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6368677A JPS6031908B2 (en) | 1977-05-30 | 1977-05-30 | Etching method and etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6368677A JPS6031908B2 (en) | 1977-05-30 | 1977-05-30 | Etching method and etching device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53147637A true JPS53147637A (en) | 1978-12-22 |
JPS6031908B2 JPS6031908B2 (en) | 1985-07-25 |
Family
ID=13236494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6368677A Expired JPS6031908B2 (en) | 1977-05-30 | 1977-05-30 | Etching method and etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6031908B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5693328A (en) * | 1979-12-26 | 1981-07-28 | Nec Corp | Formation of mask pattern |
JPS58202533A (en) * | 1982-05-21 | 1983-11-25 | Hitachi Ltd | Surface treatment device |
JPS59135730A (en) * | 1983-01-24 | 1984-08-04 | Hitachi Ltd | Device for surface modification |
-
1977
- 1977-05-30 JP JP6368677A patent/JPS6031908B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5693328A (en) * | 1979-12-26 | 1981-07-28 | Nec Corp | Formation of mask pattern |
JPS58202533A (en) * | 1982-05-21 | 1983-11-25 | Hitachi Ltd | Surface treatment device |
JPH0542813B2 (en) * | 1982-05-21 | 1993-06-29 | Hitachi Ltd | |
JPS59135730A (en) * | 1983-01-24 | 1984-08-04 | Hitachi Ltd | Device for surface modification |
Also Published As
Publication number | Publication date |
---|---|
JPS6031908B2 (en) | 1985-07-25 |
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