JPS5314420B2 - - Google Patents

Info

Publication number
JPS5314420B2
JPS5314420B2 JP5343273A JP5343273A JPS5314420B2 JP S5314420 B2 JPS5314420 B2 JP S5314420B2 JP 5343273 A JP5343273 A JP 5343273A JP 5343273 A JP5343273 A JP 5343273A JP S5314420 B2 JPS5314420 B2 JP S5314420B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5343273A
Other languages
Japanese (ja)
Other versions
JPS503587A (US20030220297A1-20031127-C00074.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5343273A priority Critical patent/JPS5314420B2/ja
Priority to GB2023574A priority patent/GB1450293A/en
Priority to DE2422912A priority patent/DE2422912A1/de
Priority to NL7406422A priority patent/NL7406422A/xx
Priority to CA199,627A priority patent/CA1001773A/en
Priority to US05/469,841 priority patent/US3977019A/en
Priority to FR7416656A priority patent/FR2230079B1/fr
Priority to IT22697/74A priority patent/IT1012351B/it
Publication of JPS503587A publication Critical patent/JPS503587A/ja
Publication of JPS5314420B2 publication Critical patent/JPS5314420B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/408Electrodes ; Multistep manufacturing processes therefor with an insulating layer with a particular dielectric or electrostatic property, e.g. with static charges or for controlling trapped charges or moving ions, or with a plate acting on the insulator potential or the insulator charges, e.g. for controlling charges effect or potential distribution in the insulating layer, or with a semi-insulating layer contacting directly the semiconductor surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0688Integrated circuits having a three-dimensional layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/082Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
    • H01L27/0823Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
    • H01L27/0825Combination of vertical direct transistors of the same conductivity type having different characteristics,(e.g. Darlington transistors)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/085Isolated-integrated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/122Polycrystalline
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/125Polycrystalline passivation

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Element Separation (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP5343273A 1973-05-14 1973-05-14 Expired JPS5314420B2 (US20030220297A1-20031127-C00074.png)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP5343273A JPS5314420B2 (US20030220297A1-20031127-C00074.png) 1973-05-14 1973-05-14
GB2023574A GB1450293A (en) 1973-05-14 1974-05-08 Semiconductor integrated circuits
DE2422912A DE2422912A1 (de) 1973-05-14 1974-05-11 Integrierter halbleiterkreis
NL7406422A NL7406422A (US20030220297A1-20031127-C00074.png) 1973-05-14 1974-05-13
CA199,627A CA1001773A (en) 1973-05-14 1974-05-13 Darlington amplifier with high breakdown voltage
US05/469,841 US3977019A (en) 1973-05-14 1974-05-14 Semiconductor integrated circuit
FR7416656A FR2230079B1 (US20030220297A1-20031127-C00074.png) 1973-05-14 1974-05-14
IT22697/74A IT1012351B (it) 1973-05-14 1974-05-14 Circuito integrato semiconduttore

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5343273A JPS5314420B2 (US20030220297A1-20031127-C00074.png) 1973-05-14 1973-05-14

Publications (2)

Publication Number Publication Date
JPS503587A JPS503587A (US20030220297A1-20031127-C00074.png) 1975-01-14
JPS5314420B2 true JPS5314420B2 (US20030220297A1-20031127-C00074.png) 1978-05-17

Family

ID=12942669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5343273A Expired JPS5314420B2 (US20030220297A1-20031127-C00074.png) 1973-05-14 1973-05-14

Country Status (8)

Country Link
US (1) US3977019A (US20030220297A1-20031127-C00074.png)
JP (1) JPS5314420B2 (US20030220297A1-20031127-C00074.png)
CA (1) CA1001773A (US20030220297A1-20031127-C00074.png)
DE (1) DE2422912A1 (US20030220297A1-20031127-C00074.png)
FR (1) FR2230079B1 (US20030220297A1-20031127-C00074.png)
GB (1) GB1450293A (US20030220297A1-20031127-C00074.png)
IT (1) IT1012351B (US20030220297A1-20031127-C00074.png)
NL (1) NL7406422A (US20030220297A1-20031127-C00074.png)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4176372A (en) * 1974-03-30 1979-11-27 Sony Corporation Semiconductor device having oxygen doped polycrystalline passivation layer
JPS5534582B2 (US20030220297A1-20031127-C00074.png) * 1974-06-24 1980-09-08
JPS5193874A (en) * 1975-02-15 1976-08-17 Handotaisochino seizohoho
JPS51126761A (en) * 1975-04-25 1976-11-05 Sony Corp Schottky barrier type semi-conductor unit
JPS51128269A (en) * 1975-04-30 1976-11-09 Sony Corp Semiconductor unit
JPS51128268A (en) * 1975-04-30 1976-11-09 Sony Corp Semiconductor unit
US4148055A (en) * 1975-12-29 1979-04-03 U.S. Philips Corporation Integrated circuit having complementary bipolar transistors
US4160989A (en) * 1975-12-29 1979-07-10 U.S. Philips Corporation Integrated circuit having complementary bipolar transistors
JPS5383250U (US20030220297A1-20031127-C00074.png) * 1976-12-09 1978-07-10
JPS596514B2 (ja) * 1977-03-08 1984-02-13 日本電信電話株式会社 Pn接合分離法による低漏話モノリシツクpnpnスイツチマトリクス
US4194934A (en) * 1977-05-23 1980-03-25 Varo Semiconductor, Inc. Method of passivating a semiconductor device utilizing dual polycrystalline layers
DE2841943C2 (de) * 1978-09-27 1983-12-15 Metzeler Schaum Gmbh, 8940 Memmingen Vorrichtung zum kontinuierlichen Herstellen von Polyurethan-Schaumstoffblöcken mit ebener Oberfläche
US4399449A (en) * 1980-11-17 1983-08-16 International Rectifier Corporation Composite metal and polysilicon field plate structure for high voltage semiconductor devices
US4344985A (en) * 1981-03-27 1982-08-17 Rca Corporation Method of passivating a semiconductor device with a multi-layer passivant system by thermally growing a layer of oxide on an oxygen doped polycrystalline silicon layer
JPS5976466A (ja) * 1982-10-25 1984-05-01 Mitsubishi Electric Corp プレ−ナ形半導体装置
JPS6168187A (ja) * 1984-09-11 1986-04-08 キヤノン株式会社 洗浄装置
JPS61222172A (ja) * 1985-03-15 1986-10-02 Sharp Corp Mosfetのゲ−ト絶縁膜形成方法
GB2183907B (en) * 1985-11-27 1989-10-04 Raytheon Co Semiconductor device
US4936928A (en) * 1985-11-27 1990-06-26 Raytheon Company Semiconductor device
US4829689A (en) * 1986-06-25 1989-05-16 Merchandising Workshop, Inc. Article for display of information

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3725150A (en) * 1971-10-29 1973-04-03 Motorola Inc Process for making a fine geometry, self-aligned device structure

Also Published As

Publication number Publication date
JPS503587A (US20030220297A1-20031127-C00074.png) 1975-01-14
FR2230079B1 (US20030220297A1-20031127-C00074.png) 1977-10-28
US3977019A (en) 1976-08-24
NL7406422A (US20030220297A1-20031127-C00074.png) 1974-11-18
DE2422912A1 (de) 1974-12-05
GB1450293A (en) 1976-09-22
IT1012351B (it) 1977-03-10
CA1001773A (en) 1976-12-14
FR2230079A1 (US20030220297A1-20031127-C00074.png) 1974-12-13

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