JPS53139951A - Element for elastic surface wave - Google Patents

Element for elastic surface wave

Info

Publication number
JPS53139951A
JPS53139951A JP5501377A JP5501377A JPS53139951A JP S53139951 A JPS53139951 A JP S53139951A JP 5501377 A JP5501377 A JP 5501377A JP 5501377 A JP5501377 A JP 5501377A JP S53139951 A JPS53139951 A JP S53139951A
Authority
JP
Japan
Prior art keywords
surface wave
elastic surface
substrate
confirming
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5501377A
Other languages
Japanese (ja)
Inventor
Noboru Wakatsuki
Shosuke Takano
Takeshi Kamo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5501377A priority Critical patent/JPS53139951A/en
Publication of JPS53139951A publication Critical patent/JPS53139951A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE:To improve various characteristics including temperature coefficient and electromechanical coupling coefficient, by confirming the optimum range for the film thickness of silicon oxide film coated on a substrate and for the Y axis rotational angle of the substrate.
JP5501377A 1977-05-13 1977-05-13 Element for elastic surface wave Pending JPS53139951A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5501377A JPS53139951A (en) 1977-05-13 1977-05-13 Element for elastic surface wave

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5501377A JPS53139951A (en) 1977-05-13 1977-05-13 Element for elastic surface wave

Publications (1)

Publication Number Publication Date
JPS53139951A true JPS53139951A (en) 1978-12-06

Family

ID=12986766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5501377A Pending JPS53139951A (en) 1977-05-13 1977-05-13 Element for elastic surface wave

Country Status (1)

Country Link
JP (1) JPS53139951A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2260023A (en) * 1991-09-25 1993-03-31 Mitsubishi Materials Corp Elastic wave device having silica film
WO2012090873A1 (en) * 2010-12-28 2012-07-05 京セラ株式会社 Elastic wave element and elastic wave device employing same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5099289A (en) * 1973-12-28 1975-08-06
JPS5184548A (en) * 1975-01-03 1976-07-23 Raytheon Co Hyomenonkyohasochi

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5099289A (en) * 1973-12-28 1975-08-06
JPS5184548A (en) * 1975-01-03 1976-07-23 Raytheon Co Hyomenonkyohasochi

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2260023A (en) * 1991-09-25 1993-03-31 Mitsubishi Materials Corp Elastic wave device having silica film
WO2012090873A1 (en) * 2010-12-28 2012-07-05 京セラ株式会社 Elastic wave element and elastic wave device employing same
JP5562441B2 (en) * 2010-12-28 2014-07-30 京セラ株式会社 Elastic wave device and elastic wave device using the same
US9503049B2 (en) 2010-12-28 2016-11-22 Kyocera Corporation Acoustic wave element and acoustic wave device using same

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