JPS53121463A - Gas phase reaction method for semiconductor substrate - Google Patents

Gas phase reaction method for semiconductor substrate

Info

Publication number
JPS53121463A
JPS53121463A JP3519877A JP3519877A JPS53121463A JP S53121463 A JPS53121463 A JP S53121463A JP 3519877 A JP3519877 A JP 3519877A JP 3519877 A JP3519877 A JP 3519877A JP S53121463 A JPS53121463 A JP S53121463A
Authority
JP
Japan
Prior art keywords
gas phase
phase reaction
semiconductor substrate
reaction method
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3519877A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6225253B2 (enrdf_load_stackoverflow
Inventor
Masaru Watanabe
Masahide Kudo
Takahiro Morimatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3519877A priority Critical patent/JPS53121463A/ja
Publication of JPS53121463A publication Critical patent/JPS53121463A/ja
Publication of JPS6225253B2 publication Critical patent/JPS6225253B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP3519877A 1977-03-31 1977-03-31 Gas phase reaction method for semiconductor substrate Granted JPS53121463A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3519877A JPS53121463A (en) 1977-03-31 1977-03-31 Gas phase reaction method for semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3519877A JPS53121463A (en) 1977-03-31 1977-03-31 Gas phase reaction method for semiconductor substrate

Publications (2)

Publication Number Publication Date
JPS53121463A true JPS53121463A (en) 1978-10-23
JPS6225253B2 JPS6225253B2 (enrdf_load_stackoverflow) 1987-06-02

Family

ID=12435156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3519877A Granted JPS53121463A (en) 1977-03-31 1977-03-31 Gas phase reaction method for semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS53121463A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63197762U (enrdf_load_stackoverflow) * 1987-06-12 1988-12-20

Also Published As

Publication number Publication date
JPS6225253B2 (enrdf_load_stackoverflow) 1987-06-02

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