JPS5311828B2 - - Google Patents

Info

Publication number
JPS5311828B2
JPS5311828B2 JP10196674A JP10196674A JPS5311828B2 JP S5311828 B2 JPS5311828 B2 JP S5311828B2 JP 10196674 A JP10196674 A JP 10196674A JP 10196674 A JP10196674 A JP 10196674A JP S5311828 B2 JPS5311828 B2 JP S5311828B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10196674A
Other languages
Japanese (ja)
Other versions
JPS5129091A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10196674A priority Critical patent/JPS5311828B2/ja
Priority to FR7527498A priority patent/FR2284186A1/fr
Publication of JPS5129091A publication Critical patent/JPS5129091A/ja
Priority to US05/687,690 priority patent/US4075488A/en
Publication of JPS5311828B2 publication Critical patent/JPS5311828B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10196674A 1974-09-06 1974-09-06 Expired JPS5311828B2 (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10196674A JPS5311828B2 (enrdf_load_stackoverflow) 1974-09-06 1974-09-06
FR7527498A FR2284186A1 (fr) 1974-09-06 1975-09-08 Appareil et procede pour former un modele de dessin desire sur un objet au moyen d'un faisceau de particules chargees
US05/687,690 US4075488A (en) 1974-09-06 1976-05-19 Pattern forming apparatus using quadrupole lenses

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10196674A JPS5311828B2 (enrdf_load_stackoverflow) 1974-09-06 1974-09-06

Publications (2)

Publication Number Publication Date
JPS5129091A JPS5129091A (enrdf_load_stackoverflow) 1976-03-11
JPS5311828B2 true JPS5311828B2 (enrdf_load_stackoverflow) 1978-04-25

Family

ID=14314598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10196674A Expired JPS5311828B2 (enrdf_load_stackoverflow) 1974-09-06 1974-09-06

Country Status (2)

Country Link
JP (1) JPS5311828B2 (enrdf_load_stackoverflow)
FR (1) FR2284186A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5360162A (en) * 1976-11-10 1978-05-30 Toshiba Corp Electron beam irradiation device
CA1100237A (en) * 1977-03-23 1981-04-28 Roger F.W. Pease Multiple electron beam exposure system
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
JPS6091630A (ja) * 1983-10-25 1985-05-23 Matsushita Electric Ind Co Ltd 不純物拡散方法
AT388628B (de) * 1986-01-31 1989-08-10 Ims Ionen Mikrofab Syst Einrichtung fuer projektionsgeraete
KR100538813B1 (ko) * 2004-07-31 2005-12-23 주식회사 하이닉스반도체 트랜지스터 파라미터의 균일도 확보를 위한 이온주입 장치및 그를 이용한 이온주입 방법
KR20240097977A (ko) 2017-09-29 2024-06-27 에이에스엠엘 네델란즈 비.브이. 하전 입자 빔 검사를 위한 샘플 사전-충전 방법들 및 장치들

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6807439A (enrdf_load_stackoverflow) * 1968-05-27 1969-12-01

Also Published As

Publication number Publication date
JPS5129091A (enrdf_load_stackoverflow) 1976-03-11
FR2284186A1 (fr) 1976-04-02
FR2284186B1 (enrdf_load_stackoverflow) 1979-01-19

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