JPS5284963A - Supporting body for substrate to be treated for vapor growth apparatus - Google Patents
Supporting body for substrate to be treated for vapor growth apparatusInfo
- Publication number
- JPS5284963A JPS5284963A JP78976A JP78976A JPS5284963A JP S5284963 A JPS5284963 A JP S5284963A JP 78976 A JP78976 A JP 78976A JP 78976 A JP78976 A JP 78976A JP S5284963 A JPS5284963 A JP S5284963A
- Authority
- JP
- Japan
- Prior art keywords
- treated
- substrate
- supporting body
- growth apparatus
- vapor growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To facilitate the removal of the substrates being treated and prevent breakage and residual strain at the cooling by providing serration to the outside cir cumference of the rests on which the substrates to be treated are placed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP78976A JPS5284963A (en) | 1976-01-07 | 1976-01-07 | Supporting body for substrate to be treated for vapor growth apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP78976A JPS5284963A (en) | 1976-01-07 | 1976-01-07 | Supporting body for substrate to be treated for vapor growth apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5284963A true JPS5284963A (en) | 1977-07-14 |
Family
ID=11483447
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP78976A Pending JPS5284963A (en) | 1976-01-07 | 1976-01-07 | Supporting body for substrate to be treated for vapor growth apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5284963A (en) |
-
1976
- 1976-01-07 JP JP78976A patent/JPS5284963A/en active Pending
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