JPS5277674A - Method of heat treatment for semiconductor board - Google Patents
Method of heat treatment for semiconductor boardInfo
- Publication number
- JPS5277674A JPS5277674A JP51151879A JP15187976A JPS5277674A JP S5277674 A JPS5277674 A JP S5277674A JP 51151879 A JP51151879 A JP 51151879A JP 15187976 A JP15187976 A JP 15187976A JP S5277674 A JPS5277674 A JP S5277674A
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- semiconductor board
- semiconductor
- board
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/14—Substrate holders or susceptors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G33/00—Screw or rotary spiral conveyors
- B65G33/02—Screw or rotary spiral conveyors for articles
- B65G33/06—Screw or rotary spiral conveyors for articles conveyed and guided by parallel screws
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/10—Reaction chambers; Selection of materials therefor
- C30B31/106—Continuous processes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19752558041 DE2558041C3 (de) | 1975-12-22 | 1975-12-22 | Verfahren zum Transport von Halbleiterscheiben durch ein Temperaturbehandlungsrohr |
DE19762619444 DE2619444C2 (de) | 1975-12-22 | 1976-05-03 | Vorrichtung zur Durchführung eines Verfahrens zum Transport von Halbleiterscheiben |
DE19762629951 DE2629951C2 (de) | 1975-12-22 | 1976-07-02 | Verfahren zum Transport von Halbleiterscheiben durch ein Temperaturbehandlungsrohr |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5277674A true JPS5277674A (en) | 1977-06-30 |
Family
ID=27186673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51151879A Pending JPS5277674A (en) | 1975-12-22 | 1976-12-17 | Method of heat treatment for semiconductor board |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5277674A (ja) |
FR (1) | FR2336796A1 (ja) |
GB (1) | GB1502754A (ja) |
IT (1) | IT1067293B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55148433A (en) * | 1979-05-08 | 1980-11-19 | Nec Corp | Manufacture of semiconductor device and device therefor |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1342183A (en) * | 1919-12-29 | 1920-06-01 | Ransom George Hardiman | Wind-screen for use on conveyances and like purposes |
GB1282322A (en) * | 1968-08-29 | 1972-07-19 | Texas Instruments Inc | Continuous deposition system |
DE1801187B1 (de) * | 1968-10-04 | 1970-04-16 | Siemens Ag | Vorrichtung zur Waermebehandlung von Siliziumscheiben |
US3602192A (en) * | 1969-05-19 | 1971-08-31 | Ibm | Semiconductor wafer processing |
US3638927A (en) * | 1969-08-01 | 1972-02-01 | Texas Instruments Inc | Slice conveyor furnace |
NL7206014A (ja) * | 1971-07-07 | 1973-01-09 | ||
US3772756A (en) * | 1972-02-23 | 1973-11-20 | Concep Machine Co Inc | Core handling system |
DE2235342A1 (de) * | 1972-07-19 | 1974-01-31 | Siemens Ag | Diffusionsrohr zur dotierung von halbleiterscheiben |
DE2357319B2 (de) * | 1973-11-16 | 1976-05-26 | Denki Kagaku Kogyo K.K., Tokio | Scheibenfoermige phosphor-dotierstoffquelle und verfahren zu deren herstellung |
DE2411142A1 (de) * | 1974-03-08 | 1975-10-09 | Bosch Gmbh Robert | Vorrichtung zum keimfreimachen von behaeltern |
-
1976
- 1976-09-24 GB GB39644/76A patent/GB1502754A/en not_active Expired
- 1976-12-17 JP JP51151879A patent/JPS5277674A/ja active Pending
- 1976-12-20 IT IT30618/76A patent/IT1067293B/it active
- 1976-12-21 FR FR7638503A patent/FR2336796A1/fr active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55148433A (en) * | 1979-05-08 | 1980-11-19 | Nec Corp | Manufacture of semiconductor device and device therefor |
JPS626646B2 (ja) * | 1979-05-08 | 1987-02-12 | Nippon Electric Co |
Also Published As
Publication number | Publication date |
---|---|
FR2336796B1 (ja) | 1983-01-21 |
IT1067293B (it) | 1985-03-16 |
FR2336796A1 (fr) | 1977-07-22 |
GB1502754A (en) | 1978-03-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS523381A (en) | Method of treating semiconductor element | |
JPS5274537A (en) | Surface treating method of copper foil | |
JPS5236477A (en) | Method of producing semiconductor device | |
JPS52795A (en) | Heat treatment process for gypsum | |
JPS51135385A (en) | Method of producing semiconductor device | |
JPS51120184A (en) | Method of producing semiconductor device | |
JPS526088A (en) | Method of producing semiconductor device | |
JPS5279668A (en) | Method of producing semiconductor device | |
JPS5260579A (en) | Method of producing semiconductor device | |
JPS5255375A (en) | Method of making semiconductor devices | |
GB1552021A (en) | Method of producing semiconductor device | |
JPS5329077A (en) | Method of treating semiconductor | |
JPS5236529A (en) | Method of surface treatment | |
JPS5275173A (en) | Method of making semiconductor devices | |
JPS5275174A (en) | Method of making semiconductor devices | |
JPS51129176A (en) | Method of making semiconductor device | |
JPS5260068A (en) | Method of making semiconductor devices | |
GB1541099A (en) | Method for thermal treatment of fine-grain material | |
GB1544982A (en) | Device for heat treatment of foodstuffs | |
JPS5277674A (en) | Method of heat treatment for semiconductor board | |
JPS5496965A (en) | Method of treating surface of semiconductor | |
JPS54102964A (en) | Method of heat treating semiconductor | |
JPS5274609A (en) | Method of heat treat men t of glass | |
MW4676A1 (en) | Method for the treatment of sugarcance | |
JPS5269982A (en) | Method of treating for getting nonninflammability |