JPS527719A - Photoresist - Google Patents

Photoresist

Info

Publication number
JPS527719A
JPS527719A JP8359875A JP8359875A JPS527719A JP S527719 A JPS527719 A JP S527719A JP 8359875 A JP8359875 A JP 8359875A JP 8359875 A JP8359875 A JP 8359875A JP S527719 A JPS527719 A JP S527719A
Authority
JP
Japan
Prior art keywords
etching
photoresist
spattering
mask
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8359875A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Shigeharu Horiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8359875A priority Critical patent/JPS527719A/en
Publication of JPS527719A publication Critical patent/JPS527719A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To protect an etching material from plasma by raising corrosion resistance using a halogen compound containing both or either of a metal of boiling point higher than 2000 deg.C and an organometallic compound as a mask on etching or spattering.
JP8359875A 1975-07-09 1975-07-09 Photoresist Pending JPS527719A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8359875A JPS527719A (en) 1975-07-09 1975-07-09 Photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8359875A JPS527719A (en) 1975-07-09 1975-07-09 Photoresist

Publications (1)

Publication Number Publication Date
JPS527719A true JPS527719A (en) 1977-01-21

Family

ID=13806917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8359875A Pending JPS527719A (en) 1975-07-09 1975-07-09 Photoresist

Country Status (1)

Country Link
JP (1) JPS527719A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58161295A (en) * 1982-03-17 1983-09-24 松下電器産業株式会社 Ac electric field light emitting element
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58161295A (en) * 1982-03-17 1983-09-24 松下電器産業株式会社 Ac electric field light emitting element
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof

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