JPS525682A - Sputtering apparatus for long length substrates - Google Patents
Sputtering apparatus for long length substratesInfo
- Publication number
- JPS525682A JPS525682A JP8094975A JP8094975A JPS525682A JP S525682 A JPS525682 A JP S525682A JP 8094975 A JP8094975 A JP 8094975A JP 8094975 A JP8094975 A JP 8094975A JP S525682 A JPS525682 A JP S525682A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering apparatus
- long length
- length substrates
- substrates
- longlength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8094975A JPS525682A (en) | 1975-07-02 | 1975-07-02 | Sputtering apparatus for long length substrates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8094975A JPS525682A (en) | 1975-07-02 | 1975-07-02 | Sputtering apparatus for long length substrates |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS525682A true JPS525682A (en) | 1977-01-17 |
Family
ID=13732739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8094975A Pending JPS525682A (en) | 1975-07-02 | 1975-07-02 | Sputtering apparatus for long length substrates |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS525682A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4278528A (en) * | 1979-10-09 | 1981-07-14 | Coulter Systems Corporation | Rectilinear sputtering apparatus and method |
US4331526A (en) * | 1979-09-24 | 1982-05-25 | Coulter Systems Corporation | Continuous sputtering apparatus and method |
US5656153A (en) * | 1994-06-10 | 1997-08-12 | Nissho Corporation | Water-removal control system with timer display for dialysis device |
-
1975
- 1975-07-02 JP JP8094975A patent/JPS525682A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4331526A (en) * | 1979-09-24 | 1982-05-25 | Coulter Systems Corporation | Continuous sputtering apparatus and method |
US4278528A (en) * | 1979-10-09 | 1981-07-14 | Coulter Systems Corporation | Rectilinear sputtering apparatus and method |
US5656153A (en) * | 1994-06-10 | 1997-08-12 | Nissho Corporation | Water-removal control system with timer display for dialysis device |
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