JPS5238385B2 - - Google Patents

Info

Publication number
JPS5238385B2
JPS5238385B2 JP50075745A JP7574575A JPS5238385B2 JP S5238385 B2 JPS5238385 B2 JP S5238385B2 JP 50075745 A JP50075745 A JP 50075745A JP 7574575 A JP7574575 A JP 7574575A JP S5238385 B2 JPS5238385 B2 JP S5238385B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50075745A
Other versions
JPS5119475A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5119475A publication Critical patent/JPS5119475A/ja
Publication of JPS5238385B2 publication Critical patent/JPS5238385B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
    • H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
    • H01L21/2652—Through-implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/007—Autodoping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/037—Diffusion-deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/06—Gettering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/145—Shaped junctions

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
  • Formation Of Insulating Films (AREA)
  • Drying Of Semiconductors (AREA)
JP50075745A 1974-07-15 1975-06-23 Ionuchikomikibanno seizohoho Granted JPS5119475A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/488,376 US3945856A (en) 1974-07-15 1974-07-15 Method of ion implantation through an electrically insulative material

Publications (2)

Publication Number Publication Date
JPS5119475A JPS5119475A (en) 1976-02-16
JPS5238385B2 true JPS5238385B2 (ja) 1977-09-28

Family

ID=23939499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50075745A Granted JPS5119475A (en) 1974-07-15 1975-06-23 Ionuchikomikibanno seizohoho

Country Status (11)

Country Link
US (1) US3945856A (ja)
JP (1) JPS5119475A (ja)
BR (1) BR7504456A (ja)
CA (1) CA1034683A (ja)
CH (1) CH594987A5 (ja)
DE (1) DE2531003B2 (ja)
FR (1) FR2279223A1 (ja)
GB (1) GB1457223A (ja)
IT (1) IT1038940B (ja)
NL (1) NL7507742A (ja)
SE (1) SE404975B (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4243435A (en) * 1979-06-22 1981-01-06 International Business Machines Corporation Bipolar transistor fabrication process with an ion implanted emitter
CA1131797A (en) * 1979-08-20 1982-09-14 Jagir S. Multani Fabrication of a semiconductor device in a simulated epitaxial layer
JPS56101757A (en) * 1980-01-18 1981-08-14 Mitsubishi Electric Corp Manufacture of semiconductor device
US4507159A (en) * 1981-10-07 1985-03-26 Advanced Micro Devices, Inc. Method of manufacturing high capacity semiconductor capacitance devices
US4567645A (en) * 1983-09-16 1986-02-04 International Business Machines Corporation Method for forming a buried subcollector in a semiconductor substrate by ion implantation
JPS60134478A (ja) * 1983-11-28 1985-07-17 ローム・コーポレーション 電気的プログラム式記憶装置を製造する方法
JPS60249319A (ja) * 1984-05-24 1985-12-10 Mitsubishi Electric Corp 半導体装置の製造方法
JPS6215864A (ja) * 1985-07-15 1987-01-24 Hitachi Ltd 太陽電池の製造方法
US5021358A (en) * 1987-05-14 1991-06-04 North American Philips Corp. Signetics Division Semiconductor fabrication process using sacrificial oxidation to reduce tunnel formation during tungsten deposition
US5026437A (en) * 1990-01-22 1991-06-25 Tencor Instruments Cantilevered microtip manufacturing by ion implantation and etching
US5244819A (en) * 1991-10-22 1993-09-14 Honeywell Inc. Method to getter contamination in semiconductor devices
US5316981A (en) * 1992-10-09 1994-05-31 Advanced Micro Devices, Inc. Method for achieving a high quality thin oxide using a sacrificial oxide anneal
US5362685A (en) * 1992-10-29 1994-11-08 Advanced Micro Devices, Inc. Method for achieving a high quality thin oxide in integrated circuit devices
US5498577A (en) * 1994-07-26 1996-03-12 Advanced Micro Devices, Inc. Method for fabricating thin oxides for a semiconductor technology
US5525529A (en) * 1994-11-16 1996-06-11 Texas Instruments Incorporated Method for reducing dopant diffusion
JP2007142134A (ja) * 2005-11-18 2007-06-07 Sumco Corp Ｓｏｉ基板の製造方法
CN113611600A (zh) * 2021-07-29 2021-11-05 上海华力微电子有限公司 半导体器件的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3388009A (en) * 1965-06-23 1968-06-11 Ion Physics Corp Method of forming a p-n junction by an ionic beam
GB1209914A (en) * 1967-03-29 1970-10-21 Marconi Co Ltd Improvements in or relating to semi-conductor devices
US3632438A (en) * 1967-09-29 1972-01-04 Texas Instruments Inc Method for increasing the stability of semiconductor devices
US3566519A (en) * 1968-04-01 1971-03-02 Sprague Electric Co Method of making field effect transistor device
US3704178A (en) * 1969-11-05 1972-11-28 Bryan H Hill Process for forming a p-n junction in a semiconductor material
US3717790A (en) * 1971-06-24 1973-02-20 Bell Telephone Labor Inc Ion implanted silicon diode array targets for electron beam camera tubes
US3793088A (en) * 1972-11-15 1974-02-19 Bell Telephone Labor Inc Compatible pnp and npn devices in an integrated circuit

Also Published As

Publication number Publication date
DE2531003A1 (de) 1976-02-05
NL7507742A (nl) 1976-01-19
JPS5119475A (en) 1976-02-16
IT1038940B (it) 1979-11-30
SE7507114L (sv) 1976-01-16
AU8258175A (en) 1977-01-06
SE404975B (sv) 1978-11-06
FR2279223A1 (fr) 1976-02-13
FR2279223B1 (ja) 1979-04-27
BR7504456A (pt) 1976-07-06
CH594987A5 (ja) 1978-01-31
US3945856A (en) 1976-03-23
GB1457223A (en) 1976-12-01
CA1034683A (en) 1978-07-11
DE2531003B2 (de) 1977-02-17

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