JPS5234935B2 - - Google Patents
Info
- Publication number
- JPS5234935B2 JPS5234935B2 JP14582574A JP14582574A JPS5234935B2 JP S5234935 B2 JPS5234935 B2 JP S5234935B2 JP 14582574 A JP14582574 A JP 14582574A JP 14582574 A JP14582574 A JP 14582574A JP S5234935 B2 JPS5234935 B2 JP S5234935B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
- C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5033—Amines aromatic
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42687773A | 1973-12-20 | 1973-12-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5097324A JPS5097324A (enrdf_load_stackoverflow) | 1975-08-02 |
| JPS5234935B2 true JPS5234935B2 (enrdf_load_stackoverflow) | 1977-09-06 |
Family
ID=23692577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14582574A Expired JPS5234935B2 (enrdf_load_stackoverflow) | 1973-12-20 | 1974-12-20 |
Country Status (9)
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4169732A (en) * | 1978-01-09 | 1979-10-02 | International Business Machines Corporation | Photosensitive coating composition and use thereof |
| NO159729C (no) * | 1978-11-01 | 1989-02-01 | Coates Brothers & Co | Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag. |
| JPS5622364A (en) | 1979-08-01 | 1981-03-02 | Matsushita Electric Ind Co Ltd | Coating composition |
| US4390615A (en) | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
| DE3374413D1 (en) * | 1982-06-24 | 1987-12-17 | Ciba Geigy Ag | Photopolymerisable coating, photopolymerisable material and its use |
| JPS61125019A (ja) * | 1984-11-16 | 1986-06-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体 |
| US4933398A (en) * | 1987-07-01 | 1990-06-12 | Ciba-Geigy Corporation | Photosensitive epoxy resins and use thereof |
| GB8715436D0 (en) * | 1987-07-01 | 1987-08-05 | Ciba Geigy Ag | Substituted anthraquinones |
| JPH0491104A (ja) * | 1990-08-06 | 1992-03-24 | Ootex Kk | 光重合反応開始剤 |
-
1974
- 1974-10-18 FR FR7439740A patent/FR2255629B1/fr not_active Expired
- 1974-11-20 GB GB5034474A patent/GB1448643A/en not_active Expired
- 1974-11-27 CA CA214897A patent/CA1048328A/en not_active Expired
- 1974-11-29 IT IT2998874A patent/IT1030846B/it active
- 1974-12-02 NL NL7415671A patent/NL7415671A/xx not_active Application Discontinuation
- 1974-12-17 CH CH1680474A patent/CH613287A5/xx not_active IP Right Cessation
- 1974-12-19 ES ES433118A patent/ES433118A1/es not_active Expired
- 1974-12-20 BR BR1070274A patent/BR7410702D0/pt unknown
- 1974-12-20 JP JP14582574A patent/JPS5234935B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1030846B (it) | 1979-04-10 |
| DE2459179A1 (de) | 1975-06-26 |
| CA1048328A (en) | 1979-02-13 |
| FR2255629A1 (enrdf_load_stackoverflow) | 1975-07-18 |
| DE2459179B2 (de) | 1977-04-21 |
| GB1448643A (en) | 1976-09-08 |
| ES433118A1 (es) | 1976-11-16 |
| JPS5097324A (enrdf_load_stackoverflow) | 1975-08-02 |
| FR2255629B1 (enrdf_load_stackoverflow) | 1976-10-22 |
| BR7410702D0 (pt) | 1975-09-02 |
| NL7415671A (nl) | 1975-06-24 |
| CH613287A5 (en) | 1979-09-14 |