JPS5223401A - Method of etching photography - Google Patents

Method of etching photography

Info

Publication number
JPS5223401A
JPS5223401A JP50098586A JP9858675A JPS5223401A JP S5223401 A JPS5223401 A JP S5223401A JP 50098586 A JP50098586 A JP 50098586A JP 9858675 A JP9858675 A JP 9858675A JP S5223401 A JPS5223401 A JP S5223401A
Authority
JP
Japan
Prior art keywords
photography
etching
etching photography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50098586A
Other languages
English (en)
Japanese (ja)
Other versions
JPS553690B2 (show.php
Inventor
Norio Hasegawa
Hiroshi Yanagisawa
Kikuo Douta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50098586A priority Critical patent/JPS5223401A/ja
Publication of JPS5223401A publication Critical patent/JPS5223401A/ja
Publication of JPS553690B2 publication Critical patent/JPS553690B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP50098586A 1975-08-15 1975-08-15 Method of etching photography Granted JPS5223401A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50098586A JPS5223401A (en) 1975-08-15 1975-08-15 Method of etching photography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50098586A JPS5223401A (en) 1975-08-15 1975-08-15 Method of etching photography

Publications (2)

Publication Number Publication Date
JPS5223401A true JPS5223401A (en) 1977-02-22
JPS553690B2 JPS553690B2 (show.php) 1980-01-26

Family

ID=14223742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50098586A Granted JPS5223401A (en) 1975-08-15 1975-08-15 Method of etching photography

Country Status (1)

Country Link
JP (1) JPS5223401A (show.php)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532077A (en) * 1978-08-28 1980-03-06 Sharp Corp Photoresist baking method
JPS56111221A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation on mask for etching
JPS57167029A (en) * 1981-03-19 1982-10-14 Hoechst Ag Burning of positive type photosensitive layer exposed and developed
JPS5919323A (ja) * 1982-07-23 1984-01-31 Matsushita Electric Ind Co Ltd エツチング方法
JPS6248018A (ja) * 1985-08-28 1987-03-02 Sony Corp レジスト膜の硬化処理方法
JPS62113141A (ja) * 1985-11-13 1987-05-25 Fuji Electric Co Ltd フオトリソグラフイ法
JPS62241333A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS62241332A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS63115337A (ja) * 1986-11-04 1988-05-19 Matsushita Electronics Corp フオトレジストの処理方法
JPS63200531A (ja) * 1987-02-17 1988-08-18 Matsushita Electronics Corp 半導体装置の製造方法
JPH02209724A (ja) * 1983-05-23 1990-08-21 Fusion Semiconductor Syst フォトレジスト硬化方法
JPH06186755A (ja) * 1993-07-01 1994-07-08 Fujitsu Ltd レジストパターンの形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111072A (en) * 1975-03-26 1976-10-01 Hitachi Ltd Photo etching method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111072A (en) * 1975-03-26 1976-10-01 Hitachi Ltd Photo etching method

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532077A (en) * 1978-08-28 1980-03-06 Sharp Corp Photoresist baking method
JPS56111221A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation on mask for etching
JPS57167029A (en) * 1981-03-19 1982-10-14 Hoechst Ag Burning of positive type photosensitive layer exposed and developed
JPS5919323A (ja) * 1982-07-23 1984-01-31 Matsushita Electric Ind Co Ltd エツチング方法
JPH02209724A (ja) * 1983-05-23 1990-08-21 Fusion Semiconductor Syst フォトレジスト硬化方法
JPS6248018A (ja) * 1985-08-28 1987-03-02 Sony Corp レジスト膜の硬化処理方法
JPS62113141A (ja) * 1985-11-13 1987-05-25 Fuji Electric Co Ltd フオトリソグラフイ法
JPS62241333A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS62241332A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS63115337A (ja) * 1986-11-04 1988-05-19 Matsushita Electronics Corp フオトレジストの処理方法
JPS63200531A (ja) * 1987-02-17 1988-08-18 Matsushita Electronics Corp 半導体装置の製造方法
JPH06186755A (ja) * 1993-07-01 1994-07-08 Fujitsu Ltd レジストパターンの形成方法

Also Published As

Publication number Publication date
JPS553690B2 (show.php) 1980-01-26

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