JPS5221351B1 - - Google Patents

Info

Publication number
JPS5221351B1
JPS5221351B1 JP46038316A JP3831671A JPS5221351B1 JP S5221351 B1 JPS5221351 B1 JP S5221351B1 JP 46038316 A JP46038316 A JP 46038316A JP 3831671 A JP3831671 A JP 3831671A JP S5221351 B1 JPS5221351 B1 JP S5221351B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46038316A
Other versions
JPS467366A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS467366A publication Critical patent/JPS467366A/ja
Publication of JPS5221351B1 publication Critical patent/JPS5221351B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/2607—Circuits therefor
    • G01R31/2637—Circuits therefor for testing other individual devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
JP46038316A 1970-06-06 1971-06-03 Pending JPS5221351B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7008274A NL7008274A (ja) 1970-06-06 1970-06-06

Publications (2)

Publication Number Publication Date
JPS467366A JPS467366A (ja) 1971-12-21
JPS5221351B1 true JPS5221351B1 (ja) 1977-06-09

Family

ID=19810258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46038316A Pending JPS5221351B1 (ja) 1970-06-06 1971-06-03

Country Status (8)

Country Link
US (1) US3735254A (ja)
JP (1) JPS5221351B1 (ja)
AU (1) AU2943171A (ja)
BE (1) BE768158A (ja)
DE (1) DE2125456C3 (ja)
FR (1) FR2094093B1 (ja)
GB (1) GB1354777A (ja)
NL (1) NL7008274A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009511925A (ja) * 2005-10-17 2009-03-19 カプレス・アクティーゼルスカブ ４点抵抗測定のインラインの位置誤差の解消

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4967568A (ja) * 1972-11-02 1974-07-01
US4179652A (en) * 1978-02-21 1979-12-18 Teradyne, Inc. Analyzing electrical circuit boards
JPS54112396A (en) * 1978-02-22 1979-09-03 Ube Ind Ltd Production of high purity anhydrous magnesium chloride
US4178543A (en) * 1978-02-23 1979-12-11 Teradyne, Inc. Analyzing electrical circuit boards
DE2808902C3 (de) * 1978-03-02 1980-12-18 Mahle Gmbh, 7000 Stuttgart Verfahren zur zerstörungsfreien Prüfung der Primär-Silizium-Verteilung an der Oberfläche von Werkstücken aus siliziumhaltigen Aluminiumlegierungen
US4232262A (en) * 1978-10-12 1980-11-04 Emo George C Connector contact terminal contamination probe
US4218653A (en) * 1978-10-12 1980-08-19 Bell Telephone Laboratories, Incorporated Connector contact contamination probe
US4646009A (en) * 1982-05-18 1987-02-24 Ade Corporation Contacts for conductivity-type sensors
US4703252A (en) * 1985-02-22 1987-10-27 Prometrix Corporation Apparatus and methods for resistivity testing
US4876430A (en) * 1988-07-25 1989-10-24 General Electric Company Preweld test method
DE3828552C2 (de) * 1988-08-23 1994-10-13 Karl Deutsch Pruef Und Mesgera Verfahren und Vorrichtung zur Rißtiefenmessung
US4893086A (en) * 1989-01-24 1990-01-09 Shrewsbury Junior R Bar-to-bar armature tester
US5166627A (en) * 1991-05-30 1992-11-24 The United States Of America As Represented By The United States Department Of Energy Method and apparatus for remote tube crevice detection by current and voltage probe resistance measurement
DE4231392A1 (de) * 1992-09-19 1994-03-24 Daimler Benz Ag Verfahren zur Bestimmung der elektronischen Eigenschaften von Halbleiterschichtstrukturen
US5495178A (en) * 1992-11-10 1996-02-27 Cheng; David Method and apparatus for measuring film thickness
WO1994011745A1 (en) * 1992-11-10 1994-05-26 David Cheng Method and apparatus for measuring film thickness
US5691648A (en) * 1992-11-10 1997-11-25 Cheng; David Method and apparatus for measuring sheet resistance and thickness of thin films and substrates
JP3922728B2 (ja) * 1993-02-01 2007-05-30 住友電気工業株式会社 金属被覆超電導線の製造方法および電解研磨装置
KR100978699B1 (ko) * 2002-01-07 2010-08-30 카프레스 에이/에스 전기적 피드백 검출 시스템 및 멀티 포인트 테스팅 장치
DE10258366A1 (de) * 2002-12-12 2004-07-08 Endress + Hauser Wetzer Gmbh + Co Kg Verfahren und Vorrichtung zur Widerstandsmessung eines temperaturabhängigen Widerstandselements
US7212016B2 (en) * 2003-04-30 2007-05-01 The Boeing Company Apparatus and methods for measuring resistance of conductive layers
US20050225345A1 (en) * 2004-04-08 2005-10-13 Solid State Measurements, Inc. Method of testing semiconductor wafers with non-penetrating probes
DE102004055181B3 (de) * 2004-11-16 2006-05-11 X-Fab Semiconductor Foundries Ag Verfahren und Anordnung zur elektrischen Messung der Dicke von Halbleiterschichten
US7372584B2 (en) * 2005-04-11 2008-05-13 Rudolph Technologies, Inc. Dual photo-acoustic and resistivity measurement system
US7268571B1 (en) * 2006-03-20 2007-09-11 Texas Instruments Incorporated Method for validating and monitoring automatic test equipment contactor
EP2469271A1 (en) * 2010-12-21 2012-06-27 Capres A/S Single-position Hall effect measurements
EP2498081A1 (en) * 2011-03-08 2012-09-12 Capres A/S Single-position hall effect measurements
JP6013361B2 (ja) 2010-12-21 2016-10-25 カプレス・アクティーゼルスカブＣａｐｒｅｓ Ａ／Ｓ 単一位置ホール効果測定
US9030219B2 (en) 2012-03-01 2015-05-12 Kla-Tencor Corporation Variable pressure four-point coated probe pin device and method
TWI500903B (zh) * 2014-03-12 2015-09-21 Ind Tech Res Inst 管壁厚度量測模組及應用其之管壁厚度量測方法
FR3028957B1 (fr) * 2014-11-24 2017-09-29 Commissariat Energie Atomique Procede de mesure de la resistance d'une couche conductrice recouverte
JP6504133B2 (ja) * 2016-08-25 2019-04-24 信越半導体株式会社 抵抗率標準サンプルの製造方法及びエピタキシャルウェーハの抵抗率測定方法
RU173990U1 (ru) * 2017-05-12 2017-09-25 Акционерное общество "Научно-производственное предприятие "Пульсар" Устройство с четырехзондовой головкой

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI12A (fi) * 1847-09-30 Tröskmaskin
US3456186A (en) * 1966-10-31 1969-07-15 Collins Radio Co Circuit for measuring sheet resistivity including an a.c. current source and average reading d.c. voltmeter switchably connected to pairs of a four probe array
US3609537A (en) * 1969-04-01 1971-09-28 Ibm Resistance standard
US3611125A (en) * 1969-06-04 1971-10-05 Sylvania Electric Prod Apparatus for measuring electrical resistance

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009511925A (ja) * 2005-10-17 2009-03-19 カプレス・アクティーゼルスカブ ４点抵抗測定のインラインの位置誤差の解消

Also Published As

Publication number Publication date
GB1354777A (en) 1974-06-05
JPS467366A (ja) 1971-12-21
FR2094093A1 (ja) 1972-02-04
NL7008274A (ja) 1971-12-08
DE2125456B2 (de) 1980-03-27
FR2094093B1 (ja) 1976-03-19
AU2943171A (en) 1972-12-07
US3735254A (en) 1973-05-22
DE2125456A1 (de) 1971-12-16
BE768158A (fr) 1971-12-06
DE2125456C3 (de) 1980-11-13

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