JPS5218552B2 - - Google Patents
Info
- Publication number
- JPS5218552B2 JPS5218552B2 JP49103571A JP10357174A JPS5218552B2 JP S5218552 B2 JPS5218552 B2 JP S5218552B2 JP 49103571 A JP49103571 A JP 49103571A JP 10357174 A JP10357174 A JP 10357174A JP S5218552 B2 JPS5218552 B2 JP S5218552B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US00395804A US3849659A (en) | 1973-09-10 | 1973-09-10 | Alignment of a patterned electron beam with a member by electron backscatter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5057385A JPS5057385A (cg-RX-API-DMAC7.html) | 1975-05-19 |
| JPS5218552B2 true JPS5218552B2 (cg-RX-API-DMAC7.html) | 1977-05-23 |
Family
ID=23564593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49103571A Expired JPS5218552B2 (cg-RX-API-DMAC7.html) | 1973-09-10 | 1974-09-10 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3849659A (cg-RX-API-DMAC7.html) |
| JP (1) | JPS5218552B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE2443121A1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1439118A (cg-RX-API-DMAC7.html) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5398781A (en) * | 1976-11-25 | 1978-08-29 | Jeol Ltd | Electron ray exposure unit |
| US4109029A (en) * | 1977-01-24 | 1978-08-22 | Hughes Aircraft Company | High resolution electron beam microfabrication process for fabricating small geometry semiconductor devices |
| DE2939044A1 (de) * | 1979-09-27 | 1981-04-09 | Ibm Deutschland Gmbh, 7000 Stuttgart | Einrichtung fuer elektronenstrahllithographie |
| US4327292A (en) * | 1980-05-13 | 1982-04-27 | Hughes Aircraft Company | Alignment process using serial detection of repetitively patterned alignment marks |
| US4431923A (en) * | 1980-05-13 | 1984-02-14 | Hughes Aircraft Company | Alignment process using serial detection of repetitively patterned alignment marks |
| US4385238A (en) * | 1981-03-03 | 1983-05-24 | Veeco Instruments Incorporated | Reregistration system for a charged particle beam exposure system |
| JPS5960306A (ja) * | 1982-09-30 | 1984-04-06 | Fujitsu Ltd | 位置決定用チップを備えた試料 |
| US4528452A (en) * | 1982-12-09 | 1985-07-09 | Electron Beam Corporation | Alignment and detection system for electron image projectors |
| GB2146168A (en) * | 1983-09-05 | 1985-04-11 | Philips Electronic Associated | Electron image projector |
| GB2157069A (en) * | 1984-04-02 | 1985-10-16 | Philips Electronic Associated | Step and repeat electron image projector |
| JP2723508B2 (ja) * | 1985-10-21 | 1998-03-09 | 日本電気株式会社 | 電子線直接描画のためのアライメント方法 |
| US4871919A (en) * | 1988-05-20 | 1989-10-03 | International Business Machines Corporation | Electron beam lithography alignment using electric field changes to achieve registration |
| US6146910A (en) * | 1999-02-02 | 2000-11-14 | The United States Of America, As Represented By The Secretary Of Commerce | Target configuration and method for extraction of overlay vectors from targets having concealed features |
| EP1342465B1 (en) * | 2002-03-05 | 2011-10-19 | Kao Corporation | Foam-type hair dye and foam-type hair dye discharge container |
| KR101041661B1 (ko) * | 2003-07-30 | 2011-06-14 | 어플라이드 머티리얼즈 이스라엘 리미티드 | 다중 검출기들을 갖는 스캐닝 전자 현미경 및 다중 검출기기반 이미징을 위한 방법 |
| US7842933B2 (en) * | 2003-10-22 | 2010-11-30 | Applied Materials Israel, Ltd. | System and method for measuring overlay errors |
| JP4538421B2 (ja) * | 2006-02-24 | 2010-09-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US9046475B2 (en) | 2011-05-19 | 2015-06-02 | Applied Materials Israel, Ltd. | High electron energy based overlay error measurement methods and systems |
| DE102016223664B4 (de) * | 2016-11-29 | 2024-05-08 | Carl Zeiss Smt Gmbh | Strahlaustaster und Verfahren zum Austasten eines geladenen Teilchenstrahls |
| JP7007152B2 (ja) * | 2017-10-19 | 2022-01-24 | 株式会社アドバンテスト | 三次元積層造形装置および積層造形方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1533755A (fr) * | 1966-08-16 | 1968-07-19 | Jeol Ltd | Dispositif pour le réglage du point de traitement dans un appareil à faisceau électrique ou analogue |
| DE1804646B2 (de) * | 1968-10-18 | 1973-03-22 | Siemens AG, 1000 Berlin u. 8000 München | Korpuskularstrahl-bearbeitungsgeraet |
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| US3710101A (en) * | 1970-10-06 | 1973-01-09 | Westinghouse Electric Corp | Apparatus and method for alignment of members to electron beams |
| US3745358A (en) * | 1971-05-10 | 1973-07-10 | Radiant Energy Systems | Alignment method and apparatus for electron projection systems |
-
1973
- 1973-09-10 US US00395804A patent/US3849659A/en not_active Expired - Lifetime
-
1974
- 1974-08-27 GB GB3733374A patent/GB1439118A/en not_active Expired
- 1974-09-09 DE DE2443121A patent/DE2443121A1/de not_active Withdrawn
- 1974-09-10 JP JP49103571A patent/JPS5218552B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3849659A (en) | 1974-11-19 |
| GB1439118A (en) | 1976-06-09 |
| DE2443121A1 (de) | 1975-03-13 |
| JPS5057385A (cg-RX-API-DMAC7.html) | 1975-05-19 |