JPS52154857A - Composition containing cyanic ester resin - Google Patents
Composition containing cyanic ester resinInfo
- Publication number
- JPS52154857A JPS52154857A JP7201276A JP7201276A JPS52154857A JP S52154857 A JPS52154857 A JP S52154857A JP 7201276 A JP7201276 A JP 7201276A JP 7201276 A JP7201276 A JP 7201276A JP S52154857 A JPS52154857 A JP S52154857A
- Authority
- JP
- Japan
- Prior art keywords
- ester resin
- composition containing
- cyanic ester
- containing cyanic
- cyanic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 title abstract 3
- 229920005989 resin Polymers 0.000 title abstract 3
- 150000002148 esters Chemical class 0.000 title abstract 2
- XLJMAIOERFSOGZ-UHFFFAOYSA-N cyanic acid Chemical compound OC#N XLJMAIOERFSOGZ-UHFFFAOYSA-N 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7201276A JPS52154857A (en) | 1976-06-18 | 1976-06-18 | Composition containing cyanic ester resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7201276A JPS52154857A (en) | 1976-06-18 | 1976-06-18 | Composition containing cyanic ester resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52154857A true JPS52154857A (en) | 1977-12-22 |
| JPS5426264B2 JPS5426264B2 (show.php) | 1979-09-03 |
Family
ID=13477062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7201276A Granted JPS52154857A (en) | 1976-06-18 | 1976-06-18 | Composition containing cyanic ester resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52154857A (show.php) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2743283A4 (en) * | 2011-08-09 | 2015-01-21 | Mitsubishi Gas Chemical Co | NOVEL CYANIC ACID ESTER COMPOUND, PROCESS FOR THE PRODUCTION THEREOF, CURABLE RESIN COMPOSITION WITH THE NOVEL CYANIC ACID ESTER COMPOUND AND HARDENING PRODUCT FROM THE HARDENED RESIN COMPOSITION |
| JPWO2013084819A1 (ja) * | 2011-12-07 | 2015-04-27 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ及び積層板 |
| WO2016163457A1 (ja) * | 2015-04-07 | 2016-10-13 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成用材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法 |
-
1976
- 1976-06-18 JP JP7201276A patent/JPS52154857A/ja active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2743283A4 (en) * | 2011-08-09 | 2015-01-21 | Mitsubishi Gas Chemical Co | NOVEL CYANIC ACID ESTER COMPOUND, PROCESS FOR THE PRODUCTION THEREOF, CURABLE RESIN COMPOSITION WITH THE NOVEL CYANIC ACID ESTER COMPOUND AND HARDENING PRODUCT FROM THE HARDENED RESIN COMPOSITION |
| TWI547469B (zh) * | 2011-08-09 | 2016-09-01 | 三菱瓦斯化學股份有限公司 | 新穎的氰酸酯化合物及其製造方法、以及含該化合物之硬化性樹脂組成物及其硬化物 |
| US10155835B2 (en) | 2011-08-09 | 2018-12-18 | Mitsubishi Gas Chemical Company, Inc. | Cyanate ester compound and method for producing the same, and curable resin composition comprising the compound, and cured product thereof composition |
| JPWO2013084819A1 (ja) * | 2011-12-07 | 2015-04-27 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ及び積層板 |
| JP2017048399A (ja) * | 2011-12-07 | 2017-03-09 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ及び積層板 |
| US9706651B2 (en) | 2011-12-07 | 2017-07-11 | Mitsubishi Gas Chemical Company, Inc. | Resin composition, prepreg, and laminate |
| WO2016163457A1 (ja) * | 2015-04-07 | 2016-10-13 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成用材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法 |
| JP6052652B1 (ja) * | 2015-04-07 | 2016-12-27 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成用材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法 |
| CN107533297A (zh) * | 2015-04-07 | 2018-01-02 | 三菱瓦斯化学株式会社 | 光刻用下层膜形成用材料、光刻用下层膜形成用组合物、光刻用下层膜及图案形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5426264B2 (show.php) | 1979-09-03 |
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