JPS52154857A - Composition containing cyanic ester resin - Google Patents

Composition containing cyanic ester resin

Info

Publication number
JPS52154857A
JPS52154857A JP7201276A JP7201276A JPS52154857A JP S52154857 A JPS52154857 A JP S52154857A JP 7201276 A JP7201276 A JP 7201276A JP 7201276 A JP7201276 A JP 7201276A JP S52154857 A JPS52154857 A JP S52154857A
Authority
JP
Japan
Prior art keywords
ester resin
composition containing
cyanic ester
containing cyanic
cyanic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7201276A
Other languages
Japanese (ja)
Other versions
JPS5426264B2 (en
Inventor
Mineaki Yakaito
Morio Take
Kazuhiro Suzuki
Kazuo Noguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP7201276A priority Critical patent/JPS52154857A/en
Publication of JPS52154857A publication Critical patent/JPS52154857A/en
Publication of JPS5426264B2 publication Critical patent/JPS5426264B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: A cyanic ester resin is incoporated with a phenol-modified aromatic hydrocarbon-formaldehyde resin esterified with cyanic acid to form title composition having good moisture absroption, water absorption, dielectric properties and heat resistance.
COPYRIGHT: (C)1977,JPO&Japio
JP7201276A 1976-06-18 1976-06-18 Composition containing cyanic ester resin Granted JPS52154857A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7201276A JPS52154857A (en) 1976-06-18 1976-06-18 Composition containing cyanic ester resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7201276A JPS52154857A (en) 1976-06-18 1976-06-18 Composition containing cyanic ester resin

Publications (2)

Publication Number Publication Date
JPS52154857A true JPS52154857A (en) 1977-12-22
JPS5426264B2 JPS5426264B2 (en) 1979-09-03

Family

ID=13477062

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7201276A Granted JPS52154857A (en) 1976-06-18 1976-06-18 Composition containing cyanic ester resin

Country Status (1)

Country Link
JP (1) JPS52154857A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2743283A4 (en) * 2011-08-09 2015-01-21 Mitsubishi Gas Chemical Co Novel cyanic acid ester compound, method for producing same, curable resin composition containing novel cyanic acid ester compound, and cured product of curable resin composition
JPWO2013084819A1 (en) * 2011-12-07 2015-04-27 三菱瓦斯化学株式会社 Resin composition, prepreg and laminate
WO2016163457A1 (en) * 2015-04-07 2016-10-13 三菱瓦斯化学株式会社 Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, and pattern formation method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2743283A4 (en) * 2011-08-09 2015-01-21 Mitsubishi Gas Chemical Co Novel cyanic acid ester compound, method for producing same, curable resin composition containing novel cyanic acid ester compound, and cured product of curable resin composition
TWI547469B (en) * 2011-08-09 2016-09-01 三菱瓦斯化學股份有限公司 Novel cyanate ester compound and production method therefor, and curable resin composition including the same compound and cured material thereof
US10155835B2 (en) 2011-08-09 2018-12-18 Mitsubishi Gas Chemical Company, Inc. Cyanate ester compound and method for producing the same, and curable resin composition comprising the compound, and cured product thereof composition
JPWO2013084819A1 (en) * 2011-12-07 2015-04-27 三菱瓦斯化学株式会社 Resin composition, prepreg and laminate
JP2017048399A (en) * 2011-12-07 2017-03-09 三菱瓦斯化学株式会社 Resin composition, prepreg and laminated sheet
US9706651B2 (en) 2011-12-07 2017-07-11 Mitsubishi Gas Chemical Company, Inc. Resin composition, prepreg, and laminate
WO2016163457A1 (en) * 2015-04-07 2016-10-13 三菱瓦斯化学株式会社 Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, and pattern formation method
JP6052652B1 (en) * 2015-04-07 2016-12-27 三菱瓦斯化学株式会社 Lithographic lower layer film forming material, Lithographic lower layer film forming composition, Lithographic lower layer film forming method and pattern forming method
CN107533297A (en) * 2015-04-07 2018-01-02 三菱瓦斯化学株式会社 Lower layer film for lithography, which forms to be formed with material, lower layer film for lithography, uses composition, lower layer film for lithography and pattern formation method

Also Published As

Publication number Publication date
JPS5426264B2 (en) 1979-09-03

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