JPS52154857A - Composition containing cyanic ester resin - Google Patents
Composition containing cyanic ester resinInfo
- Publication number
- JPS52154857A JPS52154857A JP7201276A JP7201276A JPS52154857A JP S52154857 A JPS52154857 A JP S52154857A JP 7201276 A JP7201276 A JP 7201276A JP 7201276 A JP7201276 A JP 7201276A JP S52154857 A JPS52154857 A JP S52154857A
- Authority
- JP
- Japan
- Prior art keywords
- ester resin
- composition containing
- cyanic ester
- containing cyanic
- cyanic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: A cyanic ester resin is incoporated with a phenol-modified aromatic hydrocarbon-formaldehyde resin esterified with cyanic acid to form title composition having good moisture absroption, water absorption, dielectric properties and heat resistance.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7201276A JPS52154857A (en) | 1976-06-18 | 1976-06-18 | Composition containing cyanic ester resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7201276A JPS52154857A (en) | 1976-06-18 | 1976-06-18 | Composition containing cyanic ester resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52154857A true JPS52154857A (en) | 1977-12-22 |
JPS5426264B2 JPS5426264B2 (en) | 1979-09-03 |
Family
ID=13477062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7201276A Granted JPS52154857A (en) | 1976-06-18 | 1976-06-18 | Composition containing cyanic ester resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52154857A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2743283A4 (en) * | 2011-08-09 | 2015-01-21 | Mitsubishi Gas Chemical Co | Novel cyanic acid ester compound, method for producing same, curable resin composition containing novel cyanic acid ester compound, and cured product of curable resin composition |
JPWO2013084819A1 (en) * | 2011-12-07 | 2015-04-27 | 三菱瓦斯化学株式会社 | Resin composition, prepreg and laminate |
WO2016163457A1 (en) * | 2015-04-07 | 2016-10-13 | 三菱瓦斯化学株式会社 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, and pattern formation method |
-
1976
- 1976-06-18 JP JP7201276A patent/JPS52154857A/en active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2743283A4 (en) * | 2011-08-09 | 2015-01-21 | Mitsubishi Gas Chemical Co | Novel cyanic acid ester compound, method for producing same, curable resin composition containing novel cyanic acid ester compound, and cured product of curable resin composition |
TWI547469B (en) * | 2011-08-09 | 2016-09-01 | 三菱瓦斯化學股份有限公司 | Novel cyanate ester compound and production method therefor, and curable resin composition including the same compound and cured material thereof |
US10155835B2 (en) | 2011-08-09 | 2018-12-18 | Mitsubishi Gas Chemical Company, Inc. | Cyanate ester compound and method for producing the same, and curable resin composition comprising the compound, and cured product thereof composition |
JPWO2013084819A1 (en) * | 2011-12-07 | 2015-04-27 | 三菱瓦斯化学株式会社 | Resin composition, prepreg and laminate |
JP2017048399A (en) * | 2011-12-07 | 2017-03-09 | 三菱瓦斯化学株式会社 | Resin composition, prepreg and laminated sheet |
US9706651B2 (en) | 2011-12-07 | 2017-07-11 | Mitsubishi Gas Chemical Company, Inc. | Resin composition, prepreg, and laminate |
WO2016163457A1 (en) * | 2015-04-07 | 2016-10-13 | 三菱瓦斯化学株式会社 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, and pattern formation method |
JP6052652B1 (en) * | 2015-04-07 | 2016-12-27 | 三菱瓦斯化学株式会社 | Lithographic lower layer film forming material, Lithographic lower layer film forming composition, Lithographic lower layer film forming method and pattern forming method |
CN107533297A (en) * | 2015-04-07 | 2018-01-02 | 三菱瓦斯化学株式会社 | Lower layer film for lithography, which forms to be formed with material, lower layer film for lithography, uses composition, lower layer film for lithography and pattern formation method |
Also Published As
Publication number | Publication date |
---|---|
JPS5426264B2 (en) | 1979-09-03 |
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