JPS52137978A - Liquid phase growth apparatus of semiconductors - Google Patents

Liquid phase growth apparatus of semiconductors

Info

Publication number
JPS52137978A
JPS52137978A JP5485376A JP5485376A JPS52137978A JP S52137978 A JPS52137978 A JP S52137978A JP 5485376 A JP5485376 A JP 5485376A JP 5485376 A JP5485376 A JP 5485376A JP S52137978 A JPS52137978 A JP S52137978A
Authority
JP
Japan
Prior art keywords
liquid phase
phase growth
semiconductors
growth apparatus
sliding plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5485376A
Other languages
Japanese (ja)
Other versions
JPS5532212B2 (en
Inventor
Makoto Naito
Haruaki Umetsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5485376A priority Critical patent/JPS52137978A/en
Publication of JPS52137978A publication Critical patent/JPS52137978A/en
Publication of JPS5532212B2 publication Critical patent/JPS5532212B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE: To perform liquid phase growth voluminously by matching the holes provided to a sliding plate on the bottom of a solution reservoir by operating the sliding plate from the outside thus allowing solution to enter a wafer accommodating chamber.
COPYRIGHT: (C)1977,JPO&Japio
JP5485376A 1976-05-14 1976-05-14 Liquid phase growth apparatus of semiconductors Granted JPS52137978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5485376A JPS52137978A (en) 1976-05-14 1976-05-14 Liquid phase growth apparatus of semiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5485376A JPS52137978A (en) 1976-05-14 1976-05-14 Liquid phase growth apparatus of semiconductors

Publications (2)

Publication Number Publication Date
JPS52137978A true JPS52137978A (en) 1977-11-17
JPS5532212B2 JPS5532212B2 (en) 1980-08-23

Family

ID=12982140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5485376A Granted JPS52137978A (en) 1976-05-14 1976-05-14 Liquid phase growth apparatus of semiconductors

Country Status (1)

Country Link
JP (1) JPS52137978A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49121462U (en) * 1973-02-16 1974-10-17
JPS50156361A (en) * 1974-06-04 1975-12-17
US3933123A (en) * 1971-07-13 1976-01-20 U.S. Philips Corporation Liquid phase epitaxy

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3933123A (en) * 1971-07-13 1976-01-20 U.S. Philips Corporation Liquid phase epitaxy
JPS49121462U (en) * 1973-02-16 1974-10-17
JPS50156361A (en) * 1974-06-04 1975-12-17

Also Published As

Publication number Publication date
JPS5532212B2 (en) 1980-08-23

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