JPS52126175A - Etching device - Google Patents

Etching device

Info

Publication number
JPS52126175A
JPS52126175A JP4278876A JP4278876A JPS52126175A JP S52126175 A JPS52126175 A JP S52126175A JP 4278876 A JP4278876 A JP 4278876A JP 4278876 A JP4278876 A JP 4278876A JP S52126175 A JPS52126175 A JP S52126175A
Authority
JP
Japan
Prior art keywords
ionic
etching device
microwave
capability
precision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4278876A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5334462B2 (en:Method
Inventor
Sadayuki Okudaira
Keizo Suzuki
Ichiro Shikamata
Kuniyuki Sakumichi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4278876A priority Critical patent/JPS52126175A/ja
Priority to GB15644/77A priority patent/GB1523267A/en
Priority to DE2716592A priority patent/DE2716592C3/de
Priority to US05/787,878 priority patent/US4101411A/en
Publication of JPS52126175A publication Critical patent/JPS52126175A/ja
Publication of JPS5334462B2 publication Critical patent/JPS5334462B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Welding Or Cutting Using Electron Beams (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP4278876A 1976-04-15 1976-04-15 Etching device Granted JPS52126175A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP4278876A JPS52126175A (en) 1976-04-15 1976-04-15 Etching device
GB15644/77A GB1523267A (en) 1976-04-15 1977-04-14 Plasma etching apparatus
DE2716592A DE2716592C3 (de) 1976-04-15 1977-04-14 Plasma-Ätzvorrichtung
US05/787,878 US4101411A (en) 1976-04-15 1977-04-15 Plasma etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4278876A JPS52126175A (en) 1976-04-15 1976-04-15 Etching device

Publications (2)

Publication Number Publication Date
JPS52126175A true JPS52126175A (en) 1977-10-22
JPS5334462B2 JPS5334462B2 (en:Method) 1978-09-20

Family

ID=12645695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4278876A Granted JPS52126175A (en) 1976-04-15 1976-04-15 Etching device

Country Status (1)

Country Link
JP (1) JPS52126175A (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5875839A (ja) * 1981-10-30 1983-05-07 Fujitsu Ltd スパツタ装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5875839A (ja) * 1981-10-30 1983-05-07 Fujitsu Ltd スパツタ装置

Also Published As

Publication number Publication date
JPS5334462B2 (en:Method) 1978-09-20

Similar Documents

Publication Publication Date Title
JPS5343594A (en) Ion source for chemical ionization
JPS5288900A (en) Ion beam machine tool
JPS5380966A (en) Manufacture of electrode fdr semiconductor device
JPS52126175A (en) Etching device
JPS5329672A (en) Gas etching apparatus
JPS51131997A (en) Wire cutting electrical discharge machinging device
JPS5342854A (en) Object detector
JPS51135483A (en) Semiconductor laser device
JPS5250690A (en) Etching process
JPS5297785A (en) Ion source device
JPS53106576A (en) Ion etching device
JPS5292791A (en) Smoke detector of ionization type
JPS51117978A (en) Electrode
JPS5315765A (en) Vacuum caontact prevention method of hard mask
JPS5213778A (en) Plasma-etching method
JPS534595A (en) Improved type ion detector
JPS533169A (en) Production of semiconductor device
JPS52131466A (en) Plasma etching method
JPS5222630A (en) Control device of returning exhausted gas
JPS52154691A (en) Ion source device
JPS5212513A (en) High frequency gain regulator device
JPS51131353A (en) Absorbent processing unit with scaling device
JPS535145A (en) 3-methyl-3-(6-methoxy-naphthyl)pyruvic acid amide and its preparation
JPS5255589A (en) Ion source for common use in chemical ionization and electron impulsiv e ionization
JPS5331296A (en) Ion bombardment device