JPS52119077A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS52119077A JPS52119077A JP3427476A JP3427476A JPS52119077A JP S52119077 A JPS52119077 A JP S52119077A JP 3427476 A JP3427476 A JP 3427476A JP 3427476 A JP3427476 A JP 3427476A JP S52119077 A JPS52119077 A JP S52119077A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure device
- beam exposure
- drift
- beam current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3427476A JPS52119077A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3427476A JPS52119077A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52119077A true JPS52119077A (en) | 1977-10-06 |
Family
ID=12409574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3427476A Pending JPS52119077A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52119077A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55121258A (en) * | 1979-03-13 | 1980-09-18 | Jeol Ltd | Electron beam device |
JPS57121229A (en) * | 1981-01-21 | 1982-07-28 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam drawing system |
JPS5856418A (ja) * | 1981-09-30 | 1983-04-04 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPS58117630A (ja) * | 1981-12-31 | 1983-07-13 | Fujitsu Ltd | イオンビ−ム露光装置 |
JP2009010078A (ja) * | 2007-06-27 | 2009-01-15 | Nuflare Technology Inc | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
-
1976
- 1976-03-31 JP JP3427476A patent/JPS52119077A/ja active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55121258A (en) * | 1979-03-13 | 1980-09-18 | Jeol Ltd | Electron beam device |
JPS6155733B2 (ja) * | 1979-03-13 | 1986-11-28 | Nippon Electron Optics Lab | |
JPS57121229A (en) * | 1981-01-21 | 1982-07-28 | Nippon Telegr & Teleph Corp <Ntt> | Electron beam drawing system |
JPS5856418A (ja) * | 1981-09-30 | 1983-04-04 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPS58117630A (ja) * | 1981-12-31 | 1983-07-13 | Fujitsu Ltd | イオンビ−ム露光装置 |
JP2009010078A (ja) * | 2007-06-27 | 2009-01-15 | Nuflare Technology Inc | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
JP4676461B2 (ja) * | 2007-06-27 | 2011-04-27 | 株式会社ニューフレアテクノロジー | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
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