JPS52102359A - Radiation-sensitive high-polymer composition - Google Patents

Radiation-sensitive high-polymer composition

Info

Publication number
JPS52102359A
JPS52102359A JP1976476A JP1976476A JPS52102359A JP S52102359 A JPS52102359 A JP S52102359A JP 1976476 A JP1976476 A JP 1976476A JP 1976476 A JP1976476 A JP 1976476A JP S52102359 A JPS52102359 A JP S52102359A
Authority
JP
Japan
Prior art keywords
radiation
polymer composition
sensitive high
sensitive
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1976476A
Other languages
English (en)
Other versions
JPS5340615B2 (ja
Inventor
Masataka Miyamura
Tsukasa Tada
Akira Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP1976476A priority Critical patent/JPS52102359A/ja
Publication of JPS52102359A publication Critical patent/JPS52102359A/ja
Publication of JPS5340615B2 publication Critical patent/JPS5340615B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP1976476A 1976-02-25 1976-02-25 Radiation-sensitive high-polymer composition Granted JPS52102359A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1976476A JPS52102359A (en) 1976-02-25 1976-02-25 Radiation-sensitive high-polymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1976476A JPS52102359A (en) 1976-02-25 1976-02-25 Radiation-sensitive high-polymer composition

Publications (2)

Publication Number Publication Date
JPS52102359A true JPS52102359A (en) 1977-08-27
JPS5340615B2 JPS5340615B2 (ja) 1978-10-28

Family

ID=12008395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1976476A Granted JPS52102359A (en) 1976-02-25 1976-02-25 Radiation-sensitive high-polymer composition

Country Status (1)

Country Link
JP (1) JPS52102359A (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4937879A (ja) * 1972-08-16 1974-04-08
JPS49108320A (ja) * 1973-02-17 1974-10-15
JPS524834A (en) * 1975-06-30 1977-01-14 Agency Of Ind Science & Technol Image formation method through electron beam and resisting agent compo sitions which are used for the methoi

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4937879A (ja) * 1972-08-16 1974-04-08
JPS49108320A (ja) * 1973-02-17 1974-10-15
JPS524834A (en) * 1975-06-30 1977-01-14 Agency Of Ind Science & Technol Image formation method through electron beam and resisting agent compo sitions which are used for the methoi

Also Published As

Publication number Publication date
JPS5340615B2 (ja) 1978-10-28

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