JPS5340615B2 - - Google Patents
Info
- Publication number
- JPS5340615B2 JPS5340615B2 JP1976476A JP1976476A JPS5340615B2 JP S5340615 B2 JPS5340615 B2 JP S5340615B2 JP 1976476 A JP1976476 A JP 1976476A JP 1976476 A JP1976476 A JP 1976476A JP S5340615 B2 JPS5340615 B2 JP S5340615B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1976476A JPS52102359A (en) | 1976-02-25 | 1976-02-25 | Radiation-sensitive high-polymer composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1976476A JPS52102359A (en) | 1976-02-25 | 1976-02-25 | Radiation-sensitive high-polymer composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52102359A JPS52102359A (en) | 1977-08-27 |
| JPS5340615B2 true JPS5340615B2 (ja) | 1978-10-28 |
Family
ID=12008395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1976476A Granted JPS52102359A (en) | 1976-02-25 | 1976-02-25 | Radiation-sensitive high-polymer composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52102359A (ja) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4937879A (ja) * | 1972-08-16 | 1974-04-08 | ||
| JPS49108320A (ja) * | 1973-02-17 | 1974-10-15 | ||
| JPS524834A (en) * | 1975-06-30 | 1977-01-14 | Agency Of Ind Science & Technol | Image formation method through electron beam and resisting agent compo sitions which are used for the methoi |
-
1976
- 1976-02-25 JP JP1976476A patent/JPS52102359A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4937879A (ja) * | 1972-08-16 | 1974-04-08 | ||
| JPS49108320A (ja) * | 1973-02-17 | 1974-10-15 | ||
| JPS524834A (en) * | 1975-06-30 | 1977-01-14 | Agency Of Ind Science & Technol | Image formation method through electron beam and resisting agent compo sitions which are used for the methoi |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52102359A (en) | 1977-08-27 |