JPS5195778A - - Google Patents
Info
- Publication number
- JPS5195778A JPS5195778A JP1473475A JP1473475A JPS5195778A JP S5195778 A JPS5195778 A JP S5195778A JP 1473475 A JP1473475 A JP 1473475A JP 1473475 A JP1473475 A JP 1473475A JP S5195778 A JPS5195778 A JP S5195778A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50014734A JPS589944B2 (ja) | 1975-02-03 | 1975-02-03 | フオトマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50014734A JPS589944B2 (ja) | 1975-02-03 | 1975-02-03 | フオトマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5195778A true JPS5195778A (es) | 1976-08-21 |
| JPS589944B2 JPS589944B2 (ja) | 1983-02-23 |
Family
ID=11869342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50014734A Expired JPS589944B2 (ja) | 1975-02-03 | 1975-02-03 | フオトマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS589944B2 (es) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52160402U (es) * | 1976-05-31 | 1977-12-06 | ||
| JPS5376397A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Photo mask for manufacturing magnetic bubble element |
| JPS5735952U (es) * | 1980-08-08 | 1982-02-25 | ||
| JPH05142760A (ja) * | 1991-11-25 | 1993-06-11 | Sharp Corp | フオトマスク |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50105073A (es) * | 1974-01-22 | 1975-08-19 |
-
1975
- 1975-02-03 JP JP50014734A patent/JPS589944B2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50105073A (es) * | 1974-01-22 | 1975-08-19 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52160402U (es) * | 1976-05-31 | 1977-12-06 | ||
| JPS5376397A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Photo mask for manufacturing magnetic bubble element |
| JPS6019159B2 (ja) * | 1976-12-18 | 1985-05-14 | 工業技術院長 | 磁気バブル素子製作用ホトマスク |
| JPS5735952U (es) * | 1980-08-08 | 1982-02-25 | ||
| JPH05142760A (ja) * | 1991-11-25 | 1993-06-11 | Sharp Corp | フオトマスク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS589944B2 (ja) | 1983-02-23 |