JPS5159634A - Denshibiimukanjuseitaishokuhimakuno genzoho - Google Patents

Denshibiimukanjuseitaishokuhimakuno genzoho

Info

Publication number
JPS5159634A
JPS5159634A JP50110818A JP11081875A JPS5159634A JP S5159634 A JPS5159634 A JP S5159634A JP 50110818 A JP50110818 A JP 50110818A JP 11081875 A JP11081875 A JP 11081875A JP S5159634 A JPS5159634 A JP S5159634A
Authority
JP
Japan
Prior art keywords
genzoho
denshibiimukanjuseitaishokuhimakuno
denshibiimukanjuseitaishokuhimakuno genzoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50110818A
Other languages
English (en)
Inventor
Ansoni Baaton Rushian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of JPS5159634A publication Critical patent/JPS5159634A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP50110818A 1974-09-16 1975-09-11 Denshibiimukanjuseitaishokuhimakuno genzoho Pending JPS5159634A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/506,444 US3961101A (en) 1974-09-16 1974-09-16 Process for improved development of electron-beam-sensitive resist films

Publications (1)

Publication Number Publication Date
JPS5159634A true JPS5159634A (en) 1976-05-24

Family

ID=24014616

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50110818A Pending JPS5159634A (en) 1974-09-16 1975-09-11 Denshibiimukanjuseitaishokuhimakuno genzoho

Country Status (7)

Country Link
US (1) US3961101A (ja)
JP (1) JPS5159634A (ja)
CA (1) CA1035472A (ja)
DE (1) DE2539691A1 (ja)
FR (1) FR2284907A1 (ja)
GB (1) GB1513388A (ja)
NL (1) NL7510828A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61121436A (ja) * 1984-11-19 1986-06-09 Fujitsu Ltd レジスト現像方法
JPS61156125A (ja) * 1984-12-28 1986-07-15 Fujitsu Ltd 光ディスク用原盤のプリグルーブパターン形成方法
JP2006344310A (ja) * 2005-06-09 2006-12-21 Sony Corp 現像方法および現像装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1120763A (en) * 1977-11-23 1982-03-30 James A. Carothers Enhancement of resist development
US4359520A (en) * 1977-11-23 1982-11-16 International Business Machines Corporation Enhancement of resist development
US4415653A (en) * 1981-05-07 1983-11-15 Honeywell Inc. Method of making sensitive positive electron beam resists
US4409319A (en) * 1981-07-15 1983-10-11 International Business Machines Corporation Electron beam exposed positive resist mask process
GB2166254A (en) * 1984-10-08 1986-04-30 British Telecomm Method for the production of a metal patterning mask
US4613561A (en) * 1984-10-17 1986-09-23 James Marvin Lewis Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution
JPS622254A (ja) * 1985-06-27 1987-01-08 Fuji Photo Film Co Ltd 感光材料の現像方法
US4710449A (en) * 1986-01-29 1987-12-01 Petrarch Systems, Inc. High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
US5783367A (en) * 1989-09-20 1998-07-21 Fujitsu Limited Process for production of semiconductor device and resist developing apparatus used therein
DE69031153T2 (de) * 1989-09-20 1997-12-04 Fujitsu Ltd Verfahren zur Herstellung einer Halbleitervorrichtung
EP0698825A1 (en) * 1994-07-29 1996-02-28 AT&T Corp. An energy sensitive resist material and a process for device fabrication using the resist material
JPH08235645A (ja) * 1995-02-28 1996-09-13 Pioneer Video Corp 光記録媒体用現像方法及び光記録媒体用現像装置
US7666579B1 (en) * 2001-09-17 2010-02-23 Serenity Technologies, Inc. Method and apparatus for high density storage of analog data in a durable medium

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL280959A (ja) * 1961-07-28
GB1115245A (en) * 1965-06-01 1968-05-29 Agfa Gevaert Nv Method for recording and reproducing information by surface deformation of a polymeric composition
GB1115813A (en) * 1965-06-01 1968-05-29 Agfa Gevaert Nv Method for recording and reproducing information by surface modification of a polymeric composition
US3482973A (en) * 1965-10-01 1969-12-09 Xerox Corp Imaging system
US3707373A (en) * 1969-03-17 1972-12-26 Eastman Kodak Co Lithographic plate developers
US3639185A (en) * 1969-06-30 1972-02-01 Ibm Novel etchant and process for etching thin metal films
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3674591A (en) * 1969-11-28 1972-07-04 Stromberg Datagraphix Inc Surface deformation imaging process
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
US3852771A (en) * 1973-02-12 1974-12-03 Rca Corp Electron beam recording process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61121436A (ja) * 1984-11-19 1986-06-09 Fujitsu Ltd レジスト現像方法
JPS61156125A (ja) * 1984-12-28 1986-07-15 Fujitsu Ltd 光ディスク用原盤のプリグルーブパターン形成方法
JPH0411024B2 (ja) * 1984-12-28 1992-02-27
JP2006344310A (ja) * 2005-06-09 2006-12-21 Sony Corp 現像方法および現像装置

Also Published As

Publication number Publication date
DE2539691A1 (de) 1976-03-25
GB1513388A (en) 1978-06-07
NL7510828A (nl) 1976-03-18
US3961101A (en) 1976-06-01
CA1035472A (en) 1978-07-25
FR2284907A1 (fr) 1976-04-09

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