JPS5158071A - SUPATSUTAETSUCHINGUHO - Google Patents

SUPATSUTAETSUCHINGUHO

Info

Publication number
JPS5158071A
JPS5158071A JP13287974A JP13287974A JPS5158071A JP S5158071 A JPS5158071 A JP S5158071A JP 13287974 A JP13287974 A JP 13287974A JP 13287974 A JP13287974 A JP 13287974A JP S5158071 A JPS5158071 A JP S5158071A
Authority
JP
Japan
Prior art keywords
supatsutaetsuchinguho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13287974A
Other languages
Japanese (ja)
Inventor
Naokichi Hosokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NICHIDEN BARIAN KK
NICHIDEN VARIAN KK
Original Assignee
NICHIDEN BARIAN KK
NICHIDEN VARIAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NICHIDEN BARIAN KK, NICHIDEN VARIAN KK filed Critical NICHIDEN BARIAN KK
Priority to JP13287974A priority Critical patent/JPS5158071A/en
Publication of JPS5158071A publication Critical patent/JPS5158071A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP13287974A 1974-11-18 1974-11-18 SUPATSUTAETSUCHINGUHO Pending JPS5158071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13287974A JPS5158071A (en) 1974-11-18 1974-11-18 SUPATSUTAETSUCHINGUHO

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13287974A JPS5158071A (en) 1974-11-18 1974-11-18 SUPATSUTAETSUCHINGUHO

Publications (1)

Publication Number Publication Date
JPS5158071A true JPS5158071A (en) 1976-05-21

Family

ID=15091684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13287974A Pending JPS5158071A (en) 1974-11-18 1974-11-18 SUPATSUTAETSUCHINGUHO

Country Status (1)

Country Link
JP (1) JPS5158071A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5572052A (en) * 1978-11-27 1980-05-30 Fujitsu Ltd Preparation of semiconductor device
JPS55150231A (en) * 1979-05-14 1980-11-22 Hitachi Ltd Opening method of insulating film
JPS5715423A (en) * 1980-07-01 1982-01-26 Fujitsu Ltd Manufacture of semiconductor device
JPS5720450A (en) * 1980-07-11 1982-02-02 Toshiba Corp Forming method for pattern of semiconductor device
JPS5775429A (en) * 1980-10-28 1982-05-12 Toshiba Corp Manufacture of semiconductor device
JPS57167659A (en) * 1981-03-30 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device
JPS582029A (en) * 1981-06-26 1983-01-07 Seiko Epson Corp Etching method for insulating film on semiconductor substrate
JPS5913334A (en) * 1982-07-01 1984-01-24 コミツサレ・ア・レナジイ・アトミツク Method of producing oxidized film of integrated circuit
JPS60117632A (en) * 1983-11-30 1985-06-25 Hitachi Ltd Tapered etching method of resin film
JPS62136066A (en) * 1985-12-09 1987-06-19 Mitsubishi Electric Corp Manufacture of semiconductor device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6262464B2 (en) * 1978-11-27 1987-12-26 Fujitsu Ltd
JPS5572052A (en) * 1978-11-27 1980-05-30 Fujitsu Ltd Preparation of semiconductor device
JPS55150231A (en) * 1979-05-14 1980-11-22 Hitachi Ltd Opening method of insulating film
JPH0127573B2 (en) * 1979-05-14 1989-05-30 Hitachi Ltd
JPS5715423A (en) * 1980-07-01 1982-01-26 Fujitsu Ltd Manufacture of semiconductor device
JPH0119255B2 (en) * 1980-07-01 1989-04-11 Fujitsu Ltd
JPS5720450A (en) * 1980-07-11 1982-02-02 Toshiba Corp Forming method for pattern of semiconductor device
JPS5775429A (en) * 1980-10-28 1982-05-12 Toshiba Corp Manufacture of semiconductor device
JPH0157495B2 (en) * 1980-10-28 1989-12-06 Tokyo Shibaura Electric Co
JPS57167659A (en) * 1981-03-30 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device
JPS582029A (en) * 1981-06-26 1983-01-07 Seiko Epson Corp Etching method for insulating film on semiconductor substrate
JPS5913334A (en) * 1982-07-01 1984-01-24 コミツサレ・ア・レナジイ・アトミツク Method of producing oxidized film of integrated circuit
JPS60117632A (en) * 1983-11-30 1985-06-25 Hitachi Ltd Tapered etching method of resin film
JPS62136066A (en) * 1985-12-09 1987-06-19 Mitsubishi Electric Corp Manufacture of semiconductor device

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