JPS5158071A - SUPATSUTAETSUCHINGUHO - Google Patents
SUPATSUTAETSUCHINGUHOInfo
- Publication number
- JPS5158071A JPS5158071A JP13287974A JP13287974A JPS5158071A JP S5158071 A JPS5158071 A JP S5158071A JP 13287974 A JP13287974 A JP 13287974A JP 13287974 A JP13287974 A JP 13287974A JP S5158071 A JPS5158071 A JP S5158071A
- Authority
- JP
- Japan
- Prior art keywords
- supatsutaetsuchinguho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13287974A JPS5158071A (en) | 1974-11-18 | 1974-11-18 | SUPATSUTAETSUCHINGUHO |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13287974A JPS5158071A (en) | 1974-11-18 | 1974-11-18 | SUPATSUTAETSUCHINGUHO |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5158071A true JPS5158071A (en) | 1976-05-21 |
Family
ID=15091684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13287974A Pending JPS5158071A (en) | 1974-11-18 | 1974-11-18 | SUPATSUTAETSUCHINGUHO |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5158071A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5572052A (en) * | 1978-11-27 | 1980-05-30 | Fujitsu Ltd | Preparation of semiconductor device |
JPS55150231A (en) * | 1979-05-14 | 1980-11-22 | Hitachi Ltd | Opening method of insulating film |
JPS5715423A (en) * | 1980-07-01 | 1982-01-26 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5720450A (en) * | 1980-07-11 | 1982-02-02 | Toshiba Corp | Forming method for pattern of semiconductor device |
JPS5775429A (en) * | 1980-10-28 | 1982-05-12 | Toshiba Corp | Manufacture of semiconductor device |
JPS57167659A (en) * | 1981-03-30 | 1982-10-15 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS582029A (en) * | 1981-06-26 | 1983-01-07 | Seiko Epson Corp | Etching method for insulating film on semiconductor substrate |
JPS5913334A (en) * | 1982-07-01 | 1984-01-24 | コミツサレ・ア・レナジイ・アトミツク | Method of producing oxidized film of integrated circuit |
JPS60117632A (en) * | 1983-11-30 | 1985-06-25 | Hitachi Ltd | Tapered etching method of resin film |
JPS62136066A (en) * | 1985-12-09 | 1987-06-19 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
-
1974
- 1974-11-18 JP JP13287974A patent/JPS5158071A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6262464B2 (en) * | 1978-11-27 | 1987-12-26 | Fujitsu Ltd | |
JPS5572052A (en) * | 1978-11-27 | 1980-05-30 | Fujitsu Ltd | Preparation of semiconductor device |
JPS55150231A (en) * | 1979-05-14 | 1980-11-22 | Hitachi Ltd | Opening method of insulating film |
JPH0127573B2 (en) * | 1979-05-14 | 1989-05-30 | Hitachi Ltd | |
JPS5715423A (en) * | 1980-07-01 | 1982-01-26 | Fujitsu Ltd | Manufacture of semiconductor device |
JPH0119255B2 (en) * | 1980-07-01 | 1989-04-11 | Fujitsu Ltd | |
JPS5720450A (en) * | 1980-07-11 | 1982-02-02 | Toshiba Corp | Forming method for pattern of semiconductor device |
JPS5775429A (en) * | 1980-10-28 | 1982-05-12 | Toshiba Corp | Manufacture of semiconductor device |
JPH0157495B2 (en) * | 1980-10-28 | 1989-12-06 | Tokyo Shibaura Electric Co | |
JPS57167659A (en) * | 1981-03-30 | 1982-10-15 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS582029A (en) * | 1981-06-26 | 1983-01-07 | Seiko Epson Corp | Etching method for insulating film on semiconductor substrate |
JPS5913334A (en) * | 1982-07-01 | 1984-01-24 | コミツサレ・ア・レナジイ・アトミツク | Method of producing oxidized film of integrated circuit |
JPS60117632A (en) * | 1983-11-30 | 1985-06-25 | Hitachi Ltd | Tapered etching method of resin film |
JPS62136066A (en) * | 1985-12-09 | 1987-06-19 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
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