JPS5149191B1 - - Google Patents

Info

Publication number
JPS5149191B1
JPS5149191B1 JP44043687A JP4368769A JPS5149191B1 JP S5149191 B1 JPS5149191 B1 JP S5149191B1 JP 44043687 A JP44043687 A JP 44043687A JP 4368769 A JP4368769 A JP 4368769A JP S5149191 B1 JPS5149191 B1 JP S5149191B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP44043687A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5149191B1 publication Critical patent/JPS5149191B1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP44043687A 1968-06-05 1969-06-05 Pending JPS5149191B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681769520 DE1769520A1 (de) 1968-06-05 1968-06-05 Verfahren zum epitaktischen Abscheiden von kristallinem Material aus der Gasphase,insbesondere fuer Halbleiterzwecke

Publications (1)

Publication Number Publication Date
JPS5149191B1 true JPS5149191B1 (enrdf_load_stackoverflow) 1976-12-24

Family

ID=5700164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP44043687A Pending JPS5149191B1 (enrdf_load_stackoverflow) 1968-06-05 1969-06-05

Country Status (8)

Country Link
JP (1) JPS5149191B1 (enrdf_load_stackoverflow)
AT (1) AT288811B (enrdf_load_stackoverflow)
CH (1) CH521163A (enrdf_load_stackoverflow)
DE (1) DE1769520A1 (enrdf_load_stackoverflow)
FR (1) FR1597032A (enrdf_load_stackoverflow)
GB (1) GB1260233A (enrdf_load_stackoverflow)
NL (1) NL6906275A (enrdf_load_stackoverflow)
SE (1) SE356905B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012222156A (ja) * 2011-04-08 2012-11-12 Hitachi Kokusai Electric Inc 基板処理装置、及び、搬送装置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
DE2722545C2 (de) * 1977-05-18 1984-03-08 Kurt Dr.-Ing. 7802 Merzhausen Heber Diffusionsofen zur Behandlung von Halbleitersubstraten
DE2800574A1 (de) * 1978-01-07 1979-07-12 Stanley Electric Co Ltd Medizinisches pruefgeraet zur untersuchung von ohren
DE2830589C2 (de) * 1978-07-12 1985-04-18 Ibm Deutschland Gmbh, 7000 Stuttgart Durchlaufofen zum Prozessieren von Halbleiterplättchen
DE2849240C2 (de) * 1978-11-13 1983-01-13 Siemens Ag, 1000 Berlin Und 8000 Muenchen CVD-Beschichtungsvorrichtung für Kleinteile und ihre Verwendung
FR2498813A1 (fr) * 1981-01-27 1982-07-30 Instruments Sa Installation de traitement de materiaux pour la production de semi-conducteurs
DE3427057A1 (de) * 1984-07-23 1986-01-23 Standard Elektrik Lorenz Ag, 7000 Stuttgart Anlage zum herstellen von halbleiter-schichtstrukturen durch epitaktisches wachstum
JPS6169116A (ja) * 1984-09-13 1986-04-09 Toshiba Ceramics Co Ltd シリコンウエハ−の連続cvdコ−テイング用サセプター
GB2196650A (en) * 1986-10-27 1988-05-05 Prutec Ltd Cadmium sulphide solar cells
DE3907610A1 (de) * 1989-03-09 1990-09-13 Telefunken Electronic Gmbh Epitaxieverfahren
JP2999751B2 (ja) 1997-06-27 2000-01-17 三星電子株式会社 シリカ膜の製造装置及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012222156A (ja) * 2011-04-08 2012-11-12 Hitachi Kokusai Electric Inc 基板処理装置、及び、搬送装置

Also Published As

Publication number Publication date
SE356905B (enrdf_load_stackoverflow) 1973-06-12
CH521163A (de) 1972-04-15
AT288811B (de) 1971-03-25
FR1597032A (enrdf_load_stackoverflow) 1970-06-22
NL6906275A (enrdf_load_stackoverflow) 1969-12-09
GB1260233A (en) 1972-01-12
DE1769520A1 (de) 1972-03-02

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