JPS5144065B1 - - Google Patents
Info
- Publication number
- JPS5144065B1 JPS5144065B1 JP47055693A JP5569372A JPS5144065B1 JP S5144065 B1 JPS5144065 B1 JP S5144065B1 JP 47055693 A JP47055693 A JP 47055693A JP 5569372 A JP5569372 A JP 5569372A JP S5144065 B1 JPS5144065 B1 JP S5144065B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10P50/287—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H10W20/40—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Laminated Bodies (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15797071A | 1971-06-29 | 1971-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5144065B1 true JPS5144065B1 (cg-RX-API-DMAC10.html) | 1976-11-26 |
Family
ID=22566139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47055693A Pending JPS5144065B1 (cg-RX-API-DMAC10.html) | 1971-06-29 | 1972-06-06 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3767490A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5144065B1 (cg-RX-API-DMAC10.html) |
| CA (1) | CA955508A (cg-RX-API-DMAC10.html) |
| DE (1) | DE2227344B2 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2144291A5 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1327718A (cg-RX-API-DMAC10.html) |
| IT (1) | IT960607B (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03156233A (ja) * | 1989-11-14 | 1991-07-04 | Matsushita Seiko Co Ltd | レンジフード |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3890176A (en) * | 1972-08-18 | 1975-06-17 | Gen Electric | Method for removing photoresist from substrate |
| US3871930A (en) * | 1973-12-19 | 1975-03-18 | Texas Instruments Inc | Method of etching films made of polyimide based polymers |
| NL7607298A (nl) * | 1976-07-02 | 1978-01-04 | Philips Nv | Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze. |
| US4092442A (en) * | 1976-12-30 | 1978-05-30 | International Business Machines Corporation | Method of depositing thin films utilizing a polyimide mask |
| US4292384A (en) * | 1977-09-30 | 1981-09-29 | Horizons Research Incorporated | Gaseous plasma developing and etching process employing low voltage DC generation |
| US4208242A (en) * | 1978-10-16 | 1980-06-17 | Gte Laboratories Incorporated | Method for color television picture tube aperture mask production employing PVA and removing the PVA by partial carmelizing and washing |
| US4209356A (en) * | 1978-10-18 | 1980-06-24 | General Electric Company | Selective etching of polymeric materials embodying silicones via reactor plasmas |
| DE3027941A1 (de) * | 1980-07-23 | 1982-02-25 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von reliefstrukturen aus doppellackschichten fuer integrierte halbleiterschaltungen, wobei zur strukturierung hochenergetische strahlung verwendet wird |
| DE3175488D1 (en) * | 1981-02-07 | 1986-11-20 | Ibm Deutschland | Process for the formation and the filling of holes in a layer applied to a substrate |
| US4411735A (en) * | 1982-05-06 | 1983-10-25 | National Semiconductor Corporation | Polymeric insulation layer etching process and composition |
| US6333556B1 (en) * | 1997-10-09 | 2001-12-25 | Micron Technology, Inc. | Insulating materials |
| US6858526B2 (en) * | 1998-07-14 | 2005-02-22 | Micron Technology, Inc. | Methods of forming materials between conductive electrical components, and insulating materials |
| TW473759B (en) * | 2000-02-18 | 2002-01-21 | Acer Display Tech Inc | Fabrication method for ribs of plasma display panel |
| JP2002118049A (ja) * | 2000-10-06 | 2002-04-19 | Hitachi Ltd | 半導体集積回路装置の製造方法 |
| US20050279453A1 (en) | 2004-06-17 | 2005-12-22 | Uvtech Systems, Inc. | System and methods for surface cleaning |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2443373A (en) * | 1943-08-20 | 1948-06-15 | Victor N Borsoff | Method of removing carbon and carbonaceous matter |
| US3705055A (en) * | 1970-09-18 | 1972-12-05 | Western Electric Co | Method of descumming photoresist patterns |
-
1971
- 1971-06-29 US US00157970A patent/US3767490A/en not_active Expired - Lifetime
-
1972
- 1972-04-26 IT IT23516/72A patent/IT960607B/it active
- 1972-06-06 DE DE19722227344 patent/DE2227344B2/de active Granted
- 1972-06-06 JP JP47055693A patent/JPS5144065B1/ja active Pending
- 1972-06-20 FR FR7222683A patent/FR2144291A5/fr not_active Expired
- 1972-06-22 CA CA145,357A patent/CA955508A/en not_active Expired
- 1972-06-22 GB GB2918972A patent/GB1327718A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03156233A (ja) * | 1989-11-14 | 1991-07-04 | Matsushita Seiko Co Ltd | レンジフード |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2227344A1 (de) | 1973-01-11 |
| DE2227344B2 (de) | 1976-12-09 |
| IT960607B (it) | 1973-11-30 |
| FR2144291A5 (cg-RX-API-DMAC10.html) | 1973-02-09 |
| GB1327718A (en) | 1973-08-22 |
| CA955508A (en) | 1974-10-01 |
| US3767490A (en) | 1973-10-23 |