FR2144291A5 - - Google Patents

Info

Publication number
FR2144291A5
FR2144291A5 FR7222683A FR7222683A FR2144291A5 FR 2144291 A5 FR2144291 A5 FR 2144291A5 FR 7222683 A FR7222683 A FR 7222683A FR 7222683 A FR7222683 A FR 7222683A FR 2144291 A5 FR2144291 A5 FR 2144291A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7222683A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of FR2144291A5 publication Critical patent/FR2144291A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H10P50/287
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • H10W20/40

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
FR7222683A 1971-06-29 1972-06-20 Expired FR2144291A5 (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15797071A 1971-06-29 1971-06-29

Publications (1)

Publication Number Publication Date
FR2144291A5 true FR2144291A5 (cg-RX-API-DMAC10.html) 1973-02-09

Family

ID=22566139

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7222683A Expired FR2144291A5 (cg-RX-API-DMAC10.html) 1971-06-29 1972-06-20

Country Status (7)

Country Link
US (1) US3767490A (cg-RX-API-DMAC10.html)
JP (1) JPS5144065B1 (cg-RX-API-DMAC10.html)
CA (1) CA955508A (cg-RX-API-DMAC10.html)
DE (1) DE2227344B2 (cg-RX-API-DMAC10.html)
FR (1) FR2144291A5 (cg-RX-API-DMAC10.html)
GB (1) GB1327718A (cg-RX-API-DMAC10.html)
IT (1) IT960607B (cg-RX-API-DMAC10.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890176A (en) * 1972-08-18 1975-06-17 Gen Electric Method for removing photoresist from substrate
US3871930A (en) * 1973-12-19 1975-03-18 Texas Instruments Inc Method of etching films made of polyimide based polymers
NL7607298A (nl) * 1976-07-02 1978-01-04 Philips Nv Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze.
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask
US4292384A (en) * 1977-09-30 1981-09-29 Horizons Research Incorporated Gaseous plasma developing and etching process employing low voltage DC generation
US4208242A (en) * 1978-10-16 1980-06-17 Gte Laboratories Incorporated Method for color television picture tube aperture mask production employing PVA and removing the PVA by partial carmelizing and washing
US4209356A (en) * 1978-10-18 1980-06-24 General Electric Company Selective etching of polymeric materials embodying silicones via reactor plasmas
DE3027941A1 (de) * 1980-07-23 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von reliefstrukturen aus doppellackschichten fuer integrierte halbleiterschaltungen, wobei zur strukturierung hochenergetische strahlung verwendet wird
EP0057738B1 (de) * 1981-02-07 1986-10-15 Ibm Deutschland Gmbh Verfahren zum Herstellen und Füllen von Löchern in einer auf einem Substrat aufliegenden Schicht
US4411735A (en) * 1982-05-06 1983-10-25 National Semiconductor Corporation Polymeric insulation layer etching process and composition
JPH03156233A (ja) * 1989-11-14 1991-07-04 Matsushita Seiko Co Ltd レンジフード
US6333556B1 (en) * 1997-10-09 2001-12-25 Micron Technology, Inc. Insulating materials
US6858526B2 (en) * 1998-07-14 2005-02-22 Micron Technology, Inc. Methods of forming materials between conductive electrical components, and insulating materials
TW473759B (en) * 2000-02-18 2002-01-21 Acer Display Tech Inc Fabrication method for ribs of plasma display panel
JP2002118049A (ja) * 2000-10-06 2002-04-19 Hitachi Ltd 半導体集積回路装置の製造方法
US20050279453A1 (en) 2004-06-17 2005-12-22 Uvtech Systems, Inc. System and methods for surface cleaning

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443373A (en) * 1943-08-20 1948-06-15 Victor N Borsoff Method of removing carbon and carbonaceous matter
US3705055A (en) * 1970-09-18 1972-12-05 Western Electric Co Method of descumming photoresist patterns

Also Published As

Publication number Publication date
JPS5144065B1 (cg-RX-API-DMAC10.html) 1976-11-26
DE2227344B2 (de) 1976-12-09
US3767490A (en) 1973-10-23
DE2227344A1 (de) 1973-01-11
GB1327718A (en) 1973-08-22
CA955508A (en) 1974-10-01
IT960607B (it) 1973-11-30

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Legal Events

Date Code Title Description
ST Notification of lapse