IT960607B - Procedimento per corrodere chimi camente strati organici dcuiti inte grati - Google Patents

Procedimento per corrodere chimi camente strati organici dcuiti inte grati

Info

Publication number
IT960607B
IT960607B IT23516/72A IT2351672A IT960607B IT 960607 B IT960607 B IT 960607B IT 23516/72 A IT23516/72 A IT 23516/72A IT 2351672 A IT2351672 A IT 2351672A IT 960607 B IT960607 B IT 960607B
Authority
IT
Italy
Prior art keywords
corroding
procedure
chemical layers
layers
chemical
Prior art date
Application number
IT23516/72A
Other languages
English (en)
Italian (it)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT960607B publication Critical patent/IT960607B/it

Links

Classifications

    • H10P50/287—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • H10W20/40—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
IT23516/72A 1971-06-29 1972-04-26 Procedimento per corrodere chimi camente strati organici dcuiti inte grati IT960607B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15797071A 1971-06-29 1971-06-29

Publications (1)

Publication Number Publication Date
IT960607B true IT960607B (it) 1973-11-30

Family

ID=22566139

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23516/72A IT960607B (it) 1971-06-29 1972-04-26 Procedimento per corrodere chimi camente strati organici dcuiti inte grati

Country Status (7)

Country Link
US (1) US3767490A (cg-RX-API-DMAC10.html)
JP (1) JPS5144065B1 (cg-RX-API-DMAC10.html)
CA (1) CA955508A (cg-RX-API-DMAC10.html)
DE (1) DE2227344B2 (cg-RX-API-DMAC10.html)
FR (1) FR2144291A5 (cg-RX-API-DMAC10.html)
GB (1) GB1327718A (cg-RX-API-DMAC10.html)
IT (1) IT960607B (cg-RX-API-DMAC10.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890176A (en) * 1972-08-18 1975-06-17 Gen Electric Method for removing photoresist from substrate
US3871930A (en) * 1973-12-19 1975-03-18 Texas Instruments Inc Method of etching films made of polyimide based polymers
NL7607298A (nl) * 1976-07-02 1978-01-04 Philips Nv Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze.
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask
US4292384A (en) * 1977-09-30 1981-09-29 Horizons Research Incorporated Gaseous plasma developing and etching process employing low voltage DC generation
US4208242A (en) * 1978-10-16 1980-06-17 Gte Laboratories Incorporated Method for color television picture tube aperture mask production employing PVA and removing the PVA by partial carmelizing and washing
US4209356A (en) * 1978-10-18 1980-06-24 General Electric Company Selective etching of polymeric materials embodying silicones via reactor plasmas
DE3027941A1 (de) * 1980-07-23 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von reliefstrukturen aus doppellackschichten fuer integrierte halbleiterschaltungen, wobei zur strukturierung hochenergetische strahlung verwendet wird
DE3175488D1 (en) * 1981-02-07 1986-11-20 Ibm Deutschland Process for the formation and the filling of holes in a layer applied to a substrate
US4411735A (en) * 1982-05-06 1983-10-25 National Semiconductor Corporation Polymeric insulation layer etching process and composition
JPH03156233A (ja) * 1989-11-14 1991-07-04 Matsushita Seiko Co Ltd レンジフード
US6333556B1 (en) * 1997-10-09 2001-12-25 Micron Technology, Inc. Insulating materials
US6858526B2 (en) * 1998-07-14 2005-02-22 Micron Technology, Inc. Methods of forming materials between conductive electrical components, and insulating materials
TW473759B (en) * 2000-02-18 2002-01-21 Acer Display Tech Inc Fabrication method for ribs of plasma display panel
JP2002118049A (ja) * 2000-10-06 2002-04-19 Hitachi Ltd 半導体集積回路装置の製造方法
US20050279453A1 (en) 2004-06-17 2005-12-22 Uvtech Systems, Inc. System and methods for surface cleaning

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443373A (en) * 1943-08-20 1948-06-15 Victor N Borsoff Method of removing carbon and carbonaceous matter
US3705055A (en) * 1970-09-18 1972-12-05 Western Electric Co Method of descumming photoresist patterns

Also Published As

Publication number Publication date
JPS5144065B1 (cg-RX-API-DMAC10.html) 1976-11-26
DE2227344A1 (de) 1973-01-11
DE2227344B2 (de) 1976-12-09
FR2144291A5 (cg-RX-API-DMAC10.html) 1973-02-09
GB1327718A (en) 1973-08-22
CA955508A (en) 1974-10-01
US3767490A (en) 1973-10-23

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