JPS5143750B1 - - Google Patents
Info
- Publication number
- JPS5143750B1 JPS5143750B1 JP46061359A JP6135971A JPS5143750B1 JP S5143750 B1 JPS5143750 B1 JP S5143750B1 JP 46061359 A JP46061359 A JP 46061359A JP 6135971 A JP6135971 A JP 6135971A JP S5143750 B1 JPS5143750 B1 JP S5143750B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3880970A GB1353739A (en) | 1970-08-12 | 1970-08-12 | Light exposure means for shadow or contact printing |
| GB728871 | 1971-03-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5143750B1 true JPS5143750B1 (de) | 1976-11-24 |
Family
ID=26241318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46061359A Pending JPS5143750B1 (de) | 1970-08-12 | 1971-08-12 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3795446A (de) |
| JP (1) | JPS5143750B1 (de) |
| FR (1) | FR2104273A5 (de) |
| IT (1) | IT939738B (de) |
| NL (1) | NL7111033A (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2439208A1 (de) * | 1974-08-16 | 1976-03-11 | Ibm Deutschland | Belichtungsvorrichtung |
| FR2356975A1 (fr) * | 1976-06-30 | 1978-01-27 | Ibm | Procede d'impression photolithographique du type a contact permettant d'obtenir des profils a resolution elevee et appareil utilisant un tel procede |
| JPS60218635A (ja) * | 1984-04-13 | 1985-11-01 | Canon Inc | 照明装置 |
| KR960010023B1 (ko) * | 1991-02-19 | 1996-07-25 | 후지쓰 가부시끼가이샤 | 투영노광(投影露光) 방법 및 투영노광용 광학 마스크 |
| JPH0536586A (ja) * | 1991-08-02 | 1993-02-12 | Canon Inc | 像投影方法及び該方法を用いた半導体デバイスの製造方法 |
| JPH0567558A (ja) * | 1991-09-06 | 1993-03-19 | Nikon Corp | 露光方法 |
| JP3194155B2 (ja) * | 1992-01-31 | 2001-07-30 | キヤノン株式会社 | 半導体デバイスの製造方法及びそれを用いた投影露光装置 |
| JP3210123B2 (ja) * | 1992-03-27 | 2001-09-17 | キヤノン株式会社 | 結像方法及び該方法を用いたデバイス製造方法 |
| JP3278896B2 (ja) * | 1992-03-31 | 2002-04-30 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
| DK69492D0 (da) * | 1992-05-26 | 1992-05-26 | Purup Prepress As | Apparat til exponering af et medie, apparat til punktexponering af et medie, samt en indretning til fastholdelse af et medie |
| US6245487B1 (en) * | 1999-08-26 | 2001-06-12 | Polyfibron Technologies, Inc. | Methods for enhancing images on relief image printing plates |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3582208A (en) * | 1967-06-01 | 1971-06-01 | Lester E Idler | Method and means for producing multidensity tint screens |
| US3548713A (en) * | 1967-10-10 | 1970-12-22 | Gerber Scientific Instr Co | Photo-exposure device using annular light beam |
| US3559546A (en) * | 1967-11-01 | 1971-02-02 | Sylvania Electric Prod | Cathode ray tube screen exposure |
| US3601018A (en) * | 1968-08-26 | 1971-08-24 | Zenith Radio Corp | Method and apparatus for exposing curved substrates |
| US3615449A (en) * | 1969-09-25 | 1971-10-26 | Rca Corp | Method of generating high area-density periodic arrays by diffraction imaging |
| US3610752A (en) * | 1970-01-15 | 1971-10-05 | Atomic Energy Commission | Preparing printed circuit boards by refracted rays |
-
1971
- 1971-07-19 IT IT69432/71A patent/IT939738B/it active
- 1971-08-11 NL NL7111033A patent/NL7111033A/xx unknown
- 1971-08-12 FR FR7129530A patent/FR2104273A5/fr not_active Expired
- 1971-08-12 US US00171286A patent/US3795446A/en not_active Expired - Lifetime
- 1971-08-12 JP JP46061359A patent/JPS5143750B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| NL7111033A (de) | 1972-02-15 |
| DE2140549B2 (de) | 1976-01-02 |
| DE2140549A1 (de) | 1972-02-17 |
| IT939738B (it) | 1973-02-10 |
| FR2104273A5 (de) | 1972-04-14 |
| US3795446A (en) | 1974-03-05 |